Target for a physical vapor deposition system
    1.
    发明公开
    Target for a physical vapor deposition system 失效
    目标物理学(Dampfabscheidungssystem)

    公开(公告)号:EP0794554A2

    公开(公告)日:1997-09-10

    申请号:EP97301501.9

    申请日:1997-03-06

    Abstract: The disclosure relates to a target (200) for a physical deposition (PVD) system. The target (202) has a portion (234) of the target that overhangs and shadows the side wall (218) of the target thus preventing material from depositing on the edge. To further reduce contaminant generation, the target is combined with an improved dark space shield (200) having a first end (224) and a second end (226), where the second end conventionally supports a collimator (110) and the first end has an inner surface (232) that is substantially vertical.

    Abstract translation: 本公开涉及用于物理沉积(PVD)系统的靶(200)。 目标(202)具有目标的一部分(234),其突出并遮蔽目标的侧壁(218),从而防止材料沉积在边缘上。 为了进一步减少污染物产生,目标与具有第一端(224)和第二端(226)的改进的暗空间屏蔽(200)组合,其中第二端通常支撑准直器(110),并且第一端具有 基本垂直的内表面(232)。

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