公开(公告)号：EP0737256B1

公开(公告)日：2000-12-20

申请号：EP94919170.4

申请日：1994-05-19

Applicant: APPLIED SCIENCE AND TECHNOLOGY, INC.

Inventor： BESEN, Mathew M. ,  SEVILLANO, Evelio ,  SMITH, Donald K.

IPC: C23C16/50 ,  H01J37/32

CPC classification number: H01J37/32211 ,  C23C16/511 ,  H01J37/32192

Abstract: A microwave plasma reactor (50) including a chamber (52) for containing a gas to be energized into a plasma with microwave energy, an electrode (62) having two surfaces (61, 63) in the chamber for radiating microwave energy from one of the surfaces into the chamber to form the plasma proximate the radiating surface (63), and a waveguide or coaxial conductor (54) for introducing microwave energy onto the other of the two electrode surfaces (61) for providing the energy to form the plasma.