Abstract:
A method for mixing fluids for process tools comprises: receiving a first fluid having a first flow and a first concentration to be supplied to a first process tool; receiving a second fluid having a second flow and second concentration; and mixing the first and the second fluid to produce a third fluid having a third flow and third concentration to be supplied to a second process tool.
Abstract:
The invention features RF plasma generation systems, methods for operating the systems, methods for calibrating the systems, and calibration apparatus. One RF plasma generation system includes an impedance matching network having an input port to receive an RF signal from an RF generator, and an output port to deliver the RF signal to an input port of a plasma. vessel associated with a load. The system includes an RF signal probe in electromagnetic communication with the input port of the impedance matching network to detect at least one RF signal parameter associated with the RF signal at the input port of the impedance matching network. The system can include a calibration storage unit that stores calibration data. The calibration data includes an association of values of the RF signal parameter with values of at least one characteristic of the load.
Abstract:
A generator cell (10) includes a high voltage assembly (12) having a high voltage electrode (24), a low voltage assembly (14) having a low voltage electrode (102), a barrier dielectric (28, 92) between the electrodes defining a discharge region (110) for producing a reactive gas, and a welded seal joining the assemblies to create a permanently sealed chamber between the assemblies including the discharge region. The generator cell may have a gap in the discharge region (110) of 0.005 inch or less. The cells may be modularly combined to form a reactive gas generator system.
Abstract:
A method for controlling a plasma used for materials processing includes generating a power for forming an electronegative plasma, detecting a signal that is related to a parameter of the plasma, and modulating the power generated in response to the signal. Modulation of the power causes a reduction in an instability of the parameter of the plasma. An apparatus for controlling a materials processing electronegative plasma includes a signal detector for detecting a signal that is related to a parameter of the plasma, and a power modulator for causing a modulation of the power for forming the plasma in response to the signal.
Abstract:
A microwave reactive gas generator (10) including a microwave power source (14) with a waveguide (12) coupled to the power source (14) for transmitting microwave radiation. A cavity (22) for establishing a microwave mode is attached to the waveguide (12), and there is a passage tube (24) through the cavity (22) transverse to the direction of propagation of the microwave radiation in the waveguide (12) for passing the gas to be excited through the cavity (22). The generator (10) also includes a device (16, 18, 20) for matching the impedance of the load to the microwave power source. The cavity (22) couples the microwave power from the waveguide (12) to the passage tube (24) to energize the gas into a reactive state.
Abstract:
The invention features an apparatus and a method for supplying ozonated water to more than one process tool. Ozonated water of a first concentration received from an ozonated water generator and water received from a source are mixed to produce ozonated water of a second concentration. The ozonated water of a second concentration is supplied to a frst process tool. Ozonated water from the ozonated water generator is supplied to a second process tool while supplying the ozonated water of the second concentration to the first process tool.
Abstract:
A method for controlling a plasma used for materials processing includes generating a power for forming an electronegative plasma, detecting a signal that is related to a parameter of the plasma, and modulating the power generated in response to the signal. Modulation of the power causes a reduction in an instability of the parameter of the plasma. An apparatus for controlling a materials processing electronegative plasma includes a signal detector for detecting a signal that is related to a parameter of the plasma, and a power modulator for causing a modulation of the power for forming the plasma in response to the signal.
Abstract in simplified Chinese:本发明提供一种射频等离子产生系统、运作该系统之方法、校准该系统之方法、以及校准设备,该射频等离子产生系统包括一阻抗匹配网络,该阻抗匹配网络具有一输入端及一输出端,该输入端用以接收源自于一射频产生器的一射频信号,该输出端用以发送该射频信号至有关一负载之一等离子容置器的一输入端;该系统包括电磁连接于该阻抗匹配网络之该输入端,用以侦测有关该阻抗匹配网络之该输入端上的该射频信号之至少一射频信号参数,该系统亦包括存储一校准数据的一校准存储单元,该校准数据报括该射频信号参数之值和该负载之至少一特性之值的一组合。
Abstract in simplified Chinese:本发明揭示一种用于等离子系统之等离子点火与冷却设备及方法。一设备可包括一容器及至少一邻近该容器之点火电极。该至少一点火电极之尺寸的总长度大于该容器信道之长度的10%。该设备可包括一介电质环形容器;一散热器,其具有借由一弹簧负载机构向前推进之多个区段;以及一热界面,其位于该容器与该散热器之间。一方法可包括提供具有一流量与一压力之一气体并将该气体之该流量的一部分导入一容器信道。在该信道中点燃该气体,同时将该流量之其余部分导离该信道。
Abstract in simplified Chinese:本发明大致有关稳定化一放大器。在一观点中,其提供能与该放大器电沟通的一稳定化模块。该稳定化模块包括一开回路控制系统与一闭回路控制系统。该开回路控制系统能用来修改该稳定化模块接收的一输入信号的至少一特性,并将控制传递给该闭回路控制系统。该闭回路控制系统然后用来修改该输入信号的至少一特性。该修改的输入信号能提供给放大器。