公开(公告)号：WO2004077022A2

公开(公告)日：2004-09-10

申请号：PCT/US2004/005827

申请日：2004-02-24

Applicant: APPLIED SCIENCE AND TECHNOLOGY, INC. ,  GOODMAN, Daniel

Inventor： GOODMAN, Daniel

IPC: G01N

CPC classification number: H01J37/32935 ,  H01J37/32082

Abstract: The invention features RF plasma generation systems, methods for operating the systems, methods for calibrating the systems, and calibration apparatus. One RF plasma generation system includes an impedance matching network having an input port to receive an RF signal from an RF generator, and an output port to deliver the RF signal to an input port of a plasma. vessel associated with a load. The system includes an RF signal probe in electromagnetic communication with the input port of the impedance matching network to detect at least one RF signal parameter associated with the RF signal at the input port of the impedance matching network. The system can include a calibration storage unit that stores calibration data. The calibration data includes an association of values of the RF signal parameter with values of at least one characteristic of the load.

Abstract translation: 本发明的特征在于RF等离子体生成系统，用于操作系统的方法，用于校准系统的方法以及校准装置。 一个RF等离子体发生系统包括阻抗匹配网络，其具有用于从RF发生器接收RF信号的输入端口和用于将RF信号传送到等离子体的输入端口的输出端口。 与负载相关的容器。 该系统包括与阻抗匹配网络的输入端口电磁通信的RF信号探测器，以在阻抗匹配网络的输入端口处检测与RF信号相关联的至少一个RF信号参数。 该系统可以包括存储校准数据的校准存储单元。 校准数据包括RF信号参数的值与负载的至少一个特性的值的关联。

公开(公告)号：WO2003107384A1

公开(公告)日：2003-12-24

申请号：PCT/US2003/015147

申请日：2003-05-14

Applicant: APPLIED SCIENCE AND TECHNOLOGY, INC.

Inventor： GOODMAN, Daniel

IPC: H01J37/32

CPC classification number: H01J37/32935 ,  H01J37/32082 ,  H01J37/3299

Abstract: A method for controlling a plasma used for materials processing includes generating a power for forming an electronegative plasma, detecting a signal that is related to a parameter of the plasma, and modulating the power generated in response to the signal. Modulation of the power causes a reduction in an instability of the parameter of the plasma. An apparatus for controlling a materials processing electronegative plasma includes a signal detector for detecting a signal that is related to a parameter of the plasma, and a power modulator for causing a modulation of the power for forming the plasma in response to the signal.

Abstract translation: 用于控制用于材料处理的等离子体的方法包括产生用于形成电负离子的功率，检测与等离子体的参数相关的信号，以及调制响应于该信号产生的功率。 功率的调制导致等离子体参数的不稳定性的降低。 用于控制材料处理电负性等离子体的装置包括用于检测与等离子体的参数相关的信号的信号检测器和用于响应于该信号而形成等离子体的功率的调制的功率调制器。

公开(公告)号：EP1506562A1

公开(公告)日：2005-02-16

申请号：EP03728897.4

申请日：2003-05-14

Applicant: Applied Science and Technology, Inc.

Inventor： GOODMAN, Daniel

IPC: H01J37/32

CPC classification number: H01J37/32935 ,  H01J37/32082 ,  H01J37/3299

Abstract: A method for controlling a plasma used for materials processing includes generating a power for forming an electronegative plasma, detecting a signal that is related to a parameter of the plasma, and modulating the power generated in response to the signal. Modulation of the power causes a reduction in an instability of the parameter of the plasma. An apparatus for controlling a materials processing electronegative plasma includes a signal detector for detecting a signal that is related to a parameter of the plasma, and a power modulator for causing a modulation of the power for forming the plasma in response to the signal.