公开(公告)号：AT355546T

公开(公告)日：2006-03-15

申请号：AT00911386

申请日：2000-03-27

Applicant: ASAHI GLASS CO LTD

Inventor： OGAWA TOHRU ,  HOSONO HIDEO ,  KIKUGAWA SHINYA ,  IKUTA YOSHIAKI ,  MASUI AKIO ,  SHIMODAIRA NORIAKI ,  YOSHIZAWA SHUHEI

IPC: H01L21/027 ,  C03B20/00 ,  C03C3/06 ,  G03F1/60 ,  G03F7/20 ,  G03F1/14 ,  C03B8/04

Abstract: An exposure apparatus, wherein at least one of optical members constituting an exposure light source system, an illuminating optical system, a photomask and a projection optical system, is made of a synthetic quartz glass for an optical member, which has an absorption coefficient of 0.70 cm or less at a wavelength of 157 nm and an infrared absorption peak attributable to SiOH stretching vibration at about 3640 cm .

公开(公告)号：DE60033642D1

公开(公告)日：2007-04-12

申请号：DE60033642

申请日：2000-03-27

Applicant: ASAHI GLASS CO LTD

Inventor： OGAWA TOHRU ,  HOSONO HIDEO ,  KIKUGAWA SHINYA ,  IKUTA YOSHIAKI ,  MASUI AKIO ,  SHIMODAIRA NORIAKI ,  YOSHIZAWA SHUHEI

IPC: G03F7/20 ,  H01L21/027 ,  C03B8/04 ,  C03B20/00 ,  C03C3/06 ,  G03F1/60

Abstract: An exposure apparatus, wherein at least one of optical members constituting an exposure light source system, an illuminating optical system, a photomask and a projection optical system, is made of a synthetic quartz glass for an optical member, which has an absorption coefficient of 0.70 cm or less at a wavelength of 157 nm and an infrared absorption peak attributable to SiOH stretching vibration at about 3640 cm .

公开(公告)号：DE60033642T2

公开(公告)日：2007-10-31

申请号：DE60033642

申请日：2000-03-27

Applicant: ASAHI GLASS CO LTD

Inventor： OGAWA TOHRU ,  HOSONO HIDEO ,  KIKUGAWA SHINYA ,  IKUTA YOSHIAKI ,  MASUI AKIO ,  SHIMODAIRA NORIAKI ,  YOSHIZAWA SHUHEI

IPC: G03F7/20 ,  H01L21/027 ,  C03B8/04 ,  C03B20/00 ,  C03C3/06 ,  G03F1/60

Abstract: An exposure apparatus, wherein at least one of optical members constituting an exposure light source system, an illuminating optical system, a photomask and a projection optical system, is made of a synthetic quartz glass for an optical member, which has an absorption coefficient of 0.70 cm or less at a wavelength of 157 nm and an infrared absorption peak attributable to SiOH stretching vibration at about 3640 cm .

公开(公告)号：EP1164629A4

公开(公告)日：2002-05-08

申请号：EP00911386

申请日：2000-03-27

Applicant: ASAHI GLASS CO LTD ,  SEMICONDUCTOR LEADING EDGE TEC

Inventor： OGAWA TOHRU ,  HOSONO HIDEO ,  KIKUGAWA SHINYA ,  IKUTA YOSHIAKI ,  MASUI AKIO ,  SHIMODAIRA NORIAKI ,  YOSHIZAWA SHUHEI

IPC: H01L21/027 ,  C03B20/00 ,  C03C3/06 ,  G03F1/60 ,  G03F7/20 ,  C03B8/04 ,  G03F1/14

CPC classification number: G03F7/70058 ,  G03F7/70241 ,  G03F7/70958

Abstract: An exposure apparatus including synthesis quartz glass for optical members, in which at least one of optical members constituting an exposure light source system, an illuminating optical system, a photomask, and a projection optical system has an absorption coefficient of 0.70 cm -1 or less at a wavelength of 157 nm and an infrared absorption peak at about 3640 cm-1 attributed to SiOH stretching vibration.