公开(公告)号：KR20180067534A

公开(公告)日：2018-06-20

申请号：KR20187010063

申请日：2016-09-23

Applicant: ASAHI GLASS CO LTD

Inventor： YAMADA MINORU ,  YAMADA ATSUSHI ,  SHIBUYA KOICHI ,  KIKUGAWA SHINYA ,  HANASHIMA KEISUKE

IPC: B23K35/26 ,  C22C13/00

CPC classification number: B23K35/26 ,  C22C13/00

Abstract: 주석, 게르마늄, 및니켈을함유하고, 상기게르마늄의함유량이 10질량% 이하이며, 상기게르마늄의함유량과, 상기니켈의함유량이, 이하의식 (1)을충족시키는접합용조성물을제공한다. [Ni]≤2.8×[Ge]…(1) (단, [Ni]는질량% 환산의니켈의함유량, [Ge]는질량% 환산의게르마늄의함유량을나타낸다.)

公开(公告)号：KR20100118125A

公开(公告)日：2010-11-04

申请号：KR20107019045

申请日：2009-02-27

Applicant: ASAHI GLASS CO LTD

Inventor： KOIKE AKIO ,  IWAHASHI YASUTOMI ,  KIKUGAWA SHINYA

IPC: C03C3/06 ,  C03C3/11 ,  C03C4/00 ,  H01L21/027

CPC classification number: C03B19/1461 ,  C03B19/1453 ,  C03B2201/12 ,  C03B2201/42 ,  C03C3/06 ,  C03C2201/12 ,  C03C2203/46 ,  C03C2203/52 ,  C03C2203/54 ,  Y02P40/57 ,  C03C3/11 ,  H01L21/0275

Abstract: 본 발명은 EUVL용 노광 장치의 광학 부재로서 적합한, 고EUV 에너지 광으로 조사시 선열팽창 계수가 거의 0이 되는 TiO
2 -SiO
2 유리를 제공한다. 본 발명은 할로겐 함유량이 100 ppm 이상이고; 가상 온도가 1,100℃ 이하이고; 20 내지 100℃의 범위의 평균 선열팽창 계수가 30 ppb/℃ 이하이고; 선열팽창 계수가 0±5 ppb/℃가 되는 온도 폭 △T가 5℃ 이상이고; 선열팽창 계수가 0 ppb/℃가 되는 온도가 30 내지 150℃의 범위 내에 있는 TiO
2 함유 실리카 유리에 관한 것이다.

公开(公告)号：WO2006080241A3

公开(公告)日：2006-09-21

申请号：PCT/JP2006300777

申请日：2006-01-13

Applicant: ASAHI GLASS CO LTD ,  KOIKE AKIO ,  IWAHASHI YASUTOMI ,  SHIMODAIRA NORIAKI ,  KIKUGAWA SHINYA ,  SUGIMOTO NAOKI

Inventor： KOIKE AKIO ,  IWAHASHI YASUTOMI ,  SHIMODAIRA NORIAKI ,  KIKUGAWA SHINYA ,  SUGIMOTO NAOKI

IPC: C03C3/06 ,  C03B19/14

CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B19/1484 ,  C03B2201/21 ,  C03B2201/42 ,  C03C17/40 ,  C03C2201/21 ,  C03C2201/42 ,  G03F7/70958

Abstract: Conventional TiO 2 -SiO 2 glass contains hydrogen atoms substantially and during deposition under ultrahigh vacuum condition, the hydrogen molecules will diffuse in the chamber, and H 2 molecules will be taken into a film thereby formed. Hydrogen molecules will readily diffuse and the optical characteristics of the multilayer film are likely to be thereby changed. An optical material for EUV lithography is disclosed, which comprises a silica glass having a TiO 2 concentration of from 3 to 12 mass% and a hydrogen molecule content of less than 5x10* molecules/cm 3 in the glass.

Abstract translation: 常规的TiO 2 -SiO 2 SiO 2玻璃基本上包含氢原子，并且在超高真空条件下沉积期间，氢分子将在室中扩散，H 2 / SUB>分子将被吸收到由此形成的膜中。 氢分子将容易扩散，并且可能由此改变多层膜的光学特性。 公开了一种用于EUV光刻的光学材料，其包括具有3至12质量％的TiO 2浓度和小于5×10 *分子/ cm 3的氢分子含量的二氧化硅玻璃 在玻璃。

公开(公告)号：DE60033642T2

公开(公告)日：2007-10-31

申请号：DE60033642

申请日：2000-03-27

Applicant: ASAHI GLASS CO LTD

Inventor： OGAWA TOHRU ,  HOSONO HIDEO ,  KIKUGAWA SHINYA ,  IKUTA YOSHIAKI ,  MASUI AKIO ,  SHIMODAIRA NORIAKI ,  YOSHIZAWA SHUHEI

IPC: G03F7/20 ,  H01L21/027 ,  C03B8/04 ,  C03B20/00 ,  C03C3/06 ,  G03F1/60

Abstract: An exposure apparatus, wherein at least one of optical members constituting an exposure light source system, an illuminating optical system, a photomask and a projection optical system, is made of a synthetic quartz glass for an optical member, which has an absorption coefficient of 0.70 cm or less at a wavelength of 157 nm and an infrared absorption peak attributable to SiOH stretching vibration at about 3640 cm .

公开(公告)号：DE602006017660D1

公开(公告)日：2010-12-02

申请号：DE602006017660

申请日：2006-02-08

Applicant: ASAHI GLASS CO LTD

Inventor： KIKUGAWA SHINYA ,  TAKADA AKIRA ,  TAKAKI SATORU ,  SATO YOSUKE ,  AKAO YASUHIKO

IPC: G03F7/00 ,  G03F1/00 ,  G03F1/60

公开(公告)号：DE60033642D1

公开(公告)日：2007-04-12

申请号：DE60033642

申请日：2000-03-27

Applicant: ASAHI GLASS CO LTD

Inventor： OGAWA TOHRU ,  HOSONO HIDEO ,  KIKUGAWA SHINYA ,  IKUTA YOSHIAKI ,  MASUI AKIO ,  SHIMODAIRA NORIAKI ,  YOSHIZAWA SHUHEI

IPC: G03F7/20 ,  H01L21/027 ,  C03B8/04 ,  C03B20/00 ,  C03C3/06 ,  G03F1/60

Abstract: An exposure apparatus, wherein at least one of optical members constituting an exposure light source system, an illuminating optical system, a photomask and a projection optical system, is made of a synthetic quartz glass for an optical member, which has an absorption coefficient of 0.70 cm or less at a wavelength of 157 nm and an infrared absorption peak attributable to SiOH stretching vibration at about 3640 cm .

公开(公告)号：DE60016185T2

公开(公告)日：2006-03-02

申请号：DE60016185

申请日：2000-09-13

Applicant: ASAHI GLASS CO LTD

Inventor： IKUTA YOSHIAKI ,  KIKUGAWA SHINYA ,  MISHIRO HITOSHI ,  ARISHIMA HIROSHI ,  OKADA KANAME ,  MATSUMOTO KATSUHIRO

IPC: G03F1/62 ,  B24B7/24 ,  C03B33/08

Abstract: It is characterized by having a pellicle sheet made of a synthetic quartz glass having an OH group concentration of at most 100 ppm and containing substantially no oxygen deficient defect. It is particularly preferred that the OH group concentration is at most 10 ppm, and the internal transmittance is at least 80 %/cm at a wavelength of 157 nm.

公开(公告)号：DE69909983D1

公开(公告)日：2003-09-04

申请号：DE69909983

申请日：1999-01-29

Applicant: ASAHI GLASS CO LTD

Inventor： IKUTA YOSHIAKI ,  KIKUGAWA SHINYA ,  MASUI AKIO ,  SHIMODAIRA NORIAKI ,  YOSHIZAWA SHUHEI

IPC: C03B19/14 ,  C03B32/00 ,  C03C3/06 ,  C03C23/00 ,  C03B20/00 ,  A63F9/00 ,  C03B37/018

公开(公告)号：DE10233424A1

公开(公告)日：2003-02-13

申请号：DE10233424

申请日：2002-07-23

Applicant: ASAHI GLASS CO LTD

Inventor： OKADA KANAME ,  KIKUGAWA SHINYA

IPC: G03F1/62 ,  G03F1/64 ,  H01L21/027 ,  G03F1/14

Abstract: The membrane device has a peripheral quartz glass membrane frame (3) with upper and lower openings and a membrane sheet (4) attached to the membrane frame, for covering one of these openings. The frame has a number of gas openings (1) spaced along 2 opposing sides, having a size which is 3/5 the height of the membrane frame or less.

公开(公告)号：DE60019691T2

公开(公告)日：2006-03-16

申请号：DE60019691

申请日：2000-07-28

Applicant: ASAHI GLASS CO LTD

Inventor： KAMISUKI YOUICHI ,  MIYAKAWA NAOMICHI ,  KIKUGAWA SHINYA ,  SUZUKI KATSUYOSHI ,  ENOMOTO SATOHIRO

IPC: C04B35/565 ,  C04B35/573 ,  C01B31/36 ,  C23C16/00 ,  C23C16/01 ,  C23C16/32 ,  C23C16/42 ,  C23C16/56 ,  C30B25/02 ,  C30B31/10 ,  H01L21/68 ,  H01L21/683

Abstract: Silicon carbide having a resistivity of from 10 to 10 OMEGA .cm and a powder X-ray diffraction peak intensity ratio of at least 0.005 as represented by Id1/Id2 where Id1 is the peak intensity in the vicinity of 2&thetas; being 34 DEG and Id2 is the peak intensity in the vicinity of 2&thetas; being 36 DEG .