公开(公告)号：US20240167157A1

公开(公告)日：2024-05-23

申请号：US18508949

申请日：2023-11-14

Applicant: ASM IP Holding B.V.

Inventor： Theodorus G.M. Oosterlaken ,  Bert Jongbloed ,  Radko Bankras ,  Bart Lindeboom

IPC: C23C16/455 ,  H01L21/67

CPC classification number: C23C16/45572 ,  H01L21/67017

Abstract: A gas injector and a semiconductor processing apparatus comprising the gas injector is disclosed. Embodiments of the presently described gas injector comprise an injector tube to inject a process gas to a process chamber of the semiconductor processing apparatus. The gas injector further comprises a cooling fluid conduit constructed and arranged to cool the injector tube.

公开(公告)号：US20250069911A1

公开(公告)日：2025-02-27

申请号：US18812488

申请日：2024-08-22

Applicant: ASM IP Holding B.V.

Inventor： Lucian Jdira ,  Johannes Maria Theodorus van Eijden ,  Theodorus G.M. Oosterlaken ,  Julien Laurentius Antonius Maria Keijser ,  Radko Bankras ,  Herbert Terhorst

IPC: H01L21/67 ,  H01L21/673

Abstract: An apparatus for processing a plurality of substrates is provided. The apparatus may have a process tube creating a process chamber and a door configured to support substrates in the process chamber and to seal the process chamber. The apparatus may have a gas injector to provide process gas into the process chamber. The gas injector may be operably connected to a process gas line in a purge chamber to purge the connection between the gas injector and the process gas line.