公开(公告)号：JP2006066919A

公开(公告)日：2006-03-09

申请号：JP2005246663

申请日：2005-08-26

Applicant: Asml Holding Nv ,  エーエスエムエル ホールディング ナームローゼ フェンノートシャップASML Holding N.V.

Inventor： MARKOYA LOUIS ,  KHMELICHEK ALEKSANDR ,  SEWELL HARRY

IPC: H01L21/027 ,  G02B5/04 ,  G02B5/18 ,  G03F7/20

CPC classification number: G03F7/70408 ,  G03F7/70341 ,  G03F7/7035 ,  G03F7/70383 ,  G03F7/70516

Abstract: PROBLEM TO BE SOLVED: To provide a system provided with an adjustable resolution which is free of the complexity of matching an interference lithography system in common use.
SOLUTION: There are provided a laser that outputs a laser beam 106, a beam splitter 103 for dividing the laser beam 106 into a plurality of beams 107, and a prism 101 that forms interference fringes on a substrate by using the plurality of beams, wherein the resolution of a lithography system can be adjusted without exchanging each optical components, in an optical path of the lithography system.
COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种具有可调分辨率的系统，其在常见的使用中没有匹配干涉光刻系统的复杂性。 解决方案：提供了一种激光器，其输出激光束106，用于将激光束106分成多个光束107的分束器103以及通过使用多个激光束106在基板上形成干涉条纹的棱镜101 光束，其中可以调整光刻系统的分辨率而不在光刻系统的光路中交换每个光学部件。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2009076937A

公开(公告)日：2009-04-09

申请号：JP2008323797

申请日：2008-12-19

Applicant: Asml Holding Nv ,  エーエスエムエル ホールディング エヌ.ブイ.

Inventor： MARKOYA LOUIS ,  KHMELICHEK ALEKSANDR ,  SEWELL HARRY

IPC: H01L21/027 ,  G02B5/00 ,  G02B5/04 ,  G02B17/02 ,  G03F7/20

CPC classification number: G03F7/70408 ,  G03F7/70341 ,  G03F7/7035 ,  G03F7/70383 ,  G03F7/70516

Abstract: PROBLEM TO BE SOLVED: To provide a system not involving the complication of adjustment of a conventional interference lithography system but having an adjustable solution.
SOLUTION: The system includes a laser which outputs a laser beam 106, a beam splitter 103 which splits the laser beam 106 into a plurality of beams 107, and a prism 101 which forms interference fringes on a substrate using the plurality of beams 107. The resolution of the lithography system can be adjusted without replacing any optical component on a light path of the lithography system.
COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供一种不涉及常规干涉光刻系统的调整的复杂性但具有可调整解决方案的系统。 解决方案：该系统包括输出激光束106的激光器，将激光束106分成多个光束107的分束器103以及使用多个光束在基板上形成干涉条纹的棱镜101 可以调节光刻系统的分辨率而不替换光刻系统的光路上的任何光学部件。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2006352071A

公开(公告)日：2006-12-28

申请号：JP2006021608

申请日：2006-01-31

Applicant: ASML HOLDING NV

Inventor： MARKOYA LOUIS J ,  SEWELL HARRY I ,  MCCAFFERTY DIANE ,  KHMELICHEK ALEKSANDR ,  KREUZER JUSTIN L

IPC: H01L21/027 ,  G02B5/18 ,  G03F7/20

Abstract: PROBLEM TO BE SOLVED: To provide an interfering lithography projector which has a capability of printing a plurality of patterns. SOLUTION: The lithography projector comprises a lighting system, a replaceable upper optical module, and a lower optical module 208. The lighting system emits radiation beams 106A, 106B. The replaceable upper optical module includes a beam splitter 104 which receives a beam and splits the beam into a plurality of portions, an aperture plate 206, and a plurality of reflection surfaces. The lower optical module 208 receives the plurality of portions of the beam from respective reflection surfaces, and directs the portions of the beam toward the surface of a board. As a result, interference fringes or contact hole patterns are formed on the board using the portions of the beam. COPYRIGHT: (C)2007,JPO&INPIT