公开(公告)号：JP2008227528A

公开(公告)日：2008-09-25

申请号：JP2008117022

申请日：2008-04-28

Applicant: Asml Holding Nv ,  エーエスエムエル ホールディング エヌ.ブイ.

Inventor： MARKOYA LOUIS J

IPC: H01L21/027 ,  G03F9/00 ,  H01L21/68 ,  H01L23/544

CPC classification number: G03F9/708 ,  G03F9/7076 ,  G03F9/7084 ,  H01L23/544 ,  H01L2223/54453 ,  H01L2924/0002 ,  H01L2924/00

Abstract: PROBLEM TO BE SOLVED: To provide an alignment system enabling measurement and modeling of an asymmetrical target, special design and/or delicate adjustment of a target geometry (geometric structure) in order to correct drawbacks of the conventional method. SOLUTION: By forming one or more sub-targets on an alignment target, the alignment target is made to have a geometry design. An alignment system aligns one or all the plurality of sub-targets. An algorithm is used for characterizing process and calculating alignment of the alignment system. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：为了校正常规方法的缺点，提供了一种能够对不对称目标进行测量和建模的对准系统，特殊设计和/或目标几何（几何结构）的精细调整。 解决方案：通过在对准目标上形成一个或多个子目标，使对准目标具有几何设计。 对准系统对齐一个或所有多个子目标。 一种算法用于表征过程并计算对准系统的对准。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2010002915A

公开(公告)日：2010-01-07

申请号：JP2009181380

申请日：2009-08-04

Applicant: Asml Holding Nv ,  Asml Netherlands Bv ,  Lsi Corp ,  エーエスエムエル ネザーランズ ビー.ブイ. ,  エーエスエムエル ホールディング エヌ.ブイ. ,  エルエスアイ コーポレーション

Inventor： TROOST KARS Z ,  BASELMANS JOHANNES JACOBUS MATHEUS ,  BLEEKER ARNO JAN ,  MARKOYA LOUIS J ,  CALLAN NEAL ,  EIB NICHOLAS K

IPC: G03F7/20 ,  G02B26/08 ,  H01L21/027

CPC classification number: G03F7/70291 ,  G03F7/70275 ,  G03F7/70358

Abstract: PROBLEM TO BE SOLVED: To provide a system that can more quickly change a pattern at a lower cost, as compared with a mask base system.
SOLUTION: The tilt and position of individually controllable element becomes simultaneously adjustable and allows a wider range of contrasts to be achieved. This can also be used to compensate for cupping of individually controllable elements. Simultaneous adjustment of both the position and the tilt of the individually controllable elements can be attained by two electrodes which are operable over a range of values.
COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：与掩模基础系统相比，提供能够以更低的成本更快速地改变图案的系统。 解决方案：独立可控元件的倾斜和位置可同时调节，可实现更宽范围的对比度。 这也可以用于补偿单独可控元件的拔罐。 可以通过两个可在一定数值范围内操作的电极来实现单独可控元件的位置和倾斜的同时调节。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2005136428A

公开(公告)日：2005-05-26

申请号：JP2004318447

申请日：2004-11-01

Applicant: Asml Holding Nv ,  エーエスエムエル ホールディング ナームローゼ フェンノートシャップ

Inventor： MARKOYA LOUIS J

IPC: G03F9/00 ,  H01L21/027 ,  H01L21/68 ,  H01L23/544

CPC classification number: G03F9/708 ,  G03F9/7076 ,  G03F9/7084 ,  H01L23/544 ,  H01L2223/54453 ,  H01L2924/0002 ,  H01L2924/00

Abstract: PROBLEM TO BE SOLVED: To provide an alignment system that enables measurement and modeling of an asymmetrical target for solving defects of the prior art, and special design and/or fine tuning of a target geometry (geometrical structure). SOLUTION: By forming one or more sub-targets on an alignment target, the alignment target is given a geometrical design, an alignment system is used to conduct alignment across one or more sub-targets, and an algorithm is used for process characterization and alignment calculation of the alignment system. COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种对准系统，其能够测量和建模用于解决现有技术的缺陷的非对称目标，以及目标几何（几何结构）的特殊设计和/或微调。 解决方案：通过在对准目标上形成一个或多个子目标，对准目标被赋予几何设计，使用对准系统对一个或多个子目标进行对准，并且将算法用于过程 对准系统的表征和对准计算。 版权所有（C）2005，JPO＆NCIPI

公开(公告)号：JP2006352071A

公开(公告)日：2006-12-28

申请号：JP2006021608

申请日：2006-01-31

Applicant: ASML HOLDING NV

Inventor： MARKOYA LOUIS J ,  SEWELL HARRY I ,  MCCAFFERTY DIANE ,  KHMELICHEK ALEKSANDR ,  KREUZER JUSTIN L

IPC: H01L21/027 ,  G02B5/18 ,  G03F7/20

Abstract: PROBLEM TO BE SOLVED: To provide an interfering lithography projector which has a capability of printing a plurality of patterns. SOLUTION: The lithography projector comprises a lighting system, a replaceable upper optical module, and a lower optical module 208. The lighting system emits radiation beams 106A, 106B. The replaceable upper optical module includes a beam splitter 104 which receives a beam and splits the beam into a plurality of portions, an aperture plate 206, and a plurality of reflection surfaces. The lower optical module 208 receives the plurality of portions of the beam from respective reflection surfaces, and directs the portions of the beam toward the surface of a board. As a result, interference fringes or contact hole patterns are formed on the board using the portions of the beam. COPYRIGHT: (C)2007,JPO&INPIT