公开(公告)号：WO2016202546A1

公开(公告)日：2016-12-22

申请号：PCT/EP2016/061847

申请日：2016-05-25

Applicant: ASML NETHERLANDS B.V.

Inventor： HUNSCHE, Stefan ,  ALDANA LASO, Rafael ,  JAIN, Vivek, Kumar ,  JOCHEMSEN, Marinus ,  ZHOU, Xinjian

IPC: G03F7/20

CPC classification number: G03F7/7065 ,  G06T3/0068 ,  G06T7/001 ,  G06T2207/30148

Abstract: A computer-implemented method of defect validation for a device manufacturing process, the method comprising: obtaining a first image of a pattern processed into an area on a substrate using the device manufacturing process under a first condition; obtaining a metrology image from the area; aligning the metrology image and the first image; and determining from the first image and the metrology image whether the area contains a defect, based on one or more classification criteria.

Abstract translation: 一种用于设备制造过程的计算机实现的缺陷验证方法，所述方法包括：使用所述设备制造过程在第一条件下获得处理到衬底上的区域中的图案的第一图像; 从该地区获取计量图像; 对准测量图像和第一图像; 以及基于一个或多个分类标准，从所述第一图像和所述测量图像确定所述区域是否包含缺陷。