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公开(公告)号：WO2021047833A1
公开(公告)日：2021-03-18
申请号：PCT/EP2020/072107
申请日：2020-08-06
Applicant: ASML NETHERLANDS B.V.
Inventor： KLINKHAMER, Jacob Fredrik Friso , ALTINI, Valerio , KATTOUW, Hans, Erik , THIJSSEN, Theo, Wilhelmus, Maria
IPC: G03F7/20
Abstract: Disclosed is a method for determining a correction for control of a lithographic process for exposing a pattern on an exposure field using a lithographic apparatus. The method comprises obtaining a spatial profile describing spatial variation of a performance parameter across at least a portion of the exposure field and co-determining control profiles for the spatial profile to minimize error in the performance parameter while ensuring a minimum contrast quality. The co-determined control profiles comprise at least a stage control profile for control of a stage arrangement of the lithographic apparatus and a lens manipulator control profile for control of a lens manipulator of the lithographic apparatus operable to perform a correction for at least magnification in a direction perpendicular to the substrate plane.
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Patent Agency Ranking
公开(公告)号：WO2018121921A1
公开(公告)日：2018-07-05
申请号：PCT/EP2017/080002
申请日：2017-11-22
Applicant: ASML NETHERLANDS B.V.
Inventor： TEL, Wim, Tjibbo , KATTOUW, Hans, Erik , ALTINI, Valerio , MOEST, Bearrach
Abstract: Disclosed is a lithographic apparatus and associated method of controlling a lithographic process. The lithographic apparatus comprises a controller configured to define a control grid associated with positioning of a substrate within the lithographic apparatus. The control grid is based on a device layout, associated with a patterning device, defining a device pattern which is to be, and/or has been, applied to the substrate in a lithographic process.
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公开(公告)号：WO2019185230A1
公开(公告)日：2019-10-03
申请号：PCT/EP2019/053376
申请日：2019-02-12
Applicant: ASML NETHERLANDS B.V.
Inventor： ALTINI, Valerio , STAALS, Frank
Abstract: Disclosed is a method for controlling a scanning exposure apparatus configured for scanning an illumination profile over a substrate to form functional areas thereon. The method comprises determining a control profile for dynamic control of the illumination profile during exposure of an exposure field comprising the functional areas, in a scanning exposure operation; and optimizing a quality of exposure of individual functional areas. The optimizing may comprise a) extending the control profile beyond the extent of the exposure field in the scanning direction; and/or b) applying a deconvolution scheme to the control profile, wherein the structure of the deconvolution scheme is based on a dimension of the illumination profile in the scanning direction.
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公开(公告)号：EP3792693A1
公开(公告)日：2021-03-17
申请号：EP19197575.4
申请日：2019-09-16
Applicant: ASML Netherlands B.V.
Inventor： KLINKHAMER, Jacob Fredrik Friso , ALTINI, Valerio , KATTOUW, Hans, Erik , THIJSSEN, Theo, Wilhelmus, Maria
IPC: G03F7/20
Abstract: Disclosed is a method for determining a correction for control of a lithographic process for exposing a pattern on an exposure field using a lithographic apparatus. The method comprises obtaining a spatial profile describing spatial variation of a performance parameter across at least a portion of the exposure field and co-determining control profiles for the spatial profile to minimize error in the performance parameter while ensuring a minimum contrast quality. The co-determined control profiles comprise at least a stage control profile for control of a stage arrangement of the lithographic apparatus and a lens manipulator control profile for control of a lens manipulator of the lithographic apparatus operable to perform a correction for at least magnification in a direction perpendicular to the substrate plane.
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公开(公告)号：EP3547029A1
公开(公告)日：2019-10-02
申请号：EP18164962.5
申请日：2018-03-29
Applicant: ASML Netherlands B.V.
Inventor： ALTINI, Valerio , STAALS, Frank
Abstract: Disclosed is a method for controlling a scanning exposure apparatus configured for scanning an illumination profile over a substrate to form functional areas thereon. The method comprises determining a control profile for dynamic control of the illumination profile during exposure of an exposure field comprising the functional areas, in a scanning exposure operation; and optimizing a quality of exposure of individual functional areas. The optimizing may comprise a) extending the control profile beyond the extent of the exposure field in the scanning direction; and/or b) applying a deconvolution scheme to the control profile, wherein the structure of the deconvolution scheme is based on a dimension of the illumination profile in the scanning direction.
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公开(公告)号：EP3343294A1
公开(公告)日：2018-07-04
申请号：EP16207472.8
申请日：2016-12-30
Applicant: ASML Netherlands B.V.
Inventor： TEL, Wim Tjibbo , KATTOUW, Hans Erik , ALTINI, Valerio , MOEST, Bearrach
CPC classification number: G03F7/70525 , G03F7/70425 , G03F7/70558 , G03F7/70725 , G03F9/7026
Abstract: Disclosed is a lithographic apparatus and associated method of controlling a lithographic process. The lithographic apparatus comprises a controller configured to define a control grid associated with positioning of a substrate within the lithographic apparatus. The control grid is based on a device layout, associated with a patterning device, defining a device pattern which is to be, and/or has been, applied to the substrate in a lithographic process.
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