公开(公告)号：US09684250B2

公开(公告)日：2017-06-20

申请号：US15287547

申请日：2016-10-06

Applicant: ASML NETHERLANDS B.V.

Inventor： Helmar Van Santen ,  Aleksey Kolesnychenko

IPC: G03B27/52 ,  G03B27/42 ,  G03F7/20

CPC classification number: G03F7/70866 ,  G03F7/70341

Abstract: A liquid supply system for an immersion lithographic projection apparatus is disclosed in which a space is defined between the projection system, a barrier member and a substrate. The barrier member is not sealed such that, during use, immersion liquid is allowed to flow out the space and between the barrier member and the substrate.

公开(公告)号：US09817321B2

公开(公告)日：2017-11-14

申请号：US15599811

申请日：2017-05-19

Applicant: ASML NETHERLANDS B.V.

Inventor： Helmar Van Santen ,  Aleksey Kolesnychenko

IPC: G03B27/52 ,  G03B27/42 ,  G03F7/20

CPC classification number: G03F7/70866 ,  G03F7/70341

Abstract: A liquid supply system for an immersion lithographic projection apparatus is disclosed in which a space is defined between the projection system, a barrier member and a substrate. The barrier member is not sealed such that, during use, immersion liquid is allowed to flow out the space and between the barrier member and the substrate.

公开(公告)号：US09465301B2

公开(公告)日：2016-10-11

申请号：US14311723

申请日：2014-06-23

Applicant: ASML NETHERLANDS B.V.

Inventor： Helmar Van Santen ,  Aleksey Kolesnychenko

IPC: G03B27/52 ,  G03B27/42 ,  G03F7/20

CPC classification number: G03F7/70866 ,  G03F7/70341

Abstract: A liquid supply system for an immersion lithographic projection apparatus is disclosed in which a space is defined between the projection system, a barrier member and a substrate. The barrier member is not sealed such that, during use, immersion liquid is allowed to flow out the space and between the barrier member and the substrate.

Abstract translation: 公开了一种用于浸没式光刻投影装置的液体供应系统，其中在投影系统，阻挡构件和基板之间限定空间。 阻挡构件不被密封，使得在使用期间，允许浸没液体流出空间以及阻挡构件和基底之间。

公开(公告)号：US20140368799A1

公开(公告)日：2014-12-18

申请号：US14311723

申请日：2014-06-23

Applicant: ASML NETHERLANDS B.V.

Inventor： Helmar Van Santen ,  Aleksey Kolesnychenko

IPC: G03F7/20

CPC classification number: G03F7/70866 ,  G03F7/70341

Abstract: A liquid supply system for an immersion lithographic projection apparatus is disclosed in which a space is defined between the projection system, a barrier member and a substrate. The barrier member is not sealed such that, during use, immersion liquid is allowed to flow out the space and between the barrier member and the substrate.

Abstract translation: 公开了一种用于浸没式光刻投影装置的液体供应系统，其中在投影系统，阻挡构件和基板之间限定空间。 阻挡构件不被密封，使得在使用期间，允许浸没液体流出空间以及阻挡构件和基底之间。

公开(公告)号：US10222706B2

公开(公告)日：2019-03-05

申请号：US14743775

申请日：2015-06-18

Applicant: ASML NETHERLANDS B.V.

Inventor： Joeri Lof ,  Antonius Theodorus Anna Maria Derksen ,  Christiaan Alexander Hoogendam ,  Aleksey Kolesnychenko ,  Erik Roelof Loopstra ,  Theodorus Marinus Modderman ,  Johannes Catharinus Hubertus Mulkens ,  Roelof Aeilko Siebrand Ritsema ,  Klaus Simon ,  Joannes Theodoor De Smit ,  Alexander Straaijer ,  Bob Streefkerk ,  Helmar Van Santen

IPC: G03B27/42 ,  G03F7/20 ,  G03F9/00

Abstract: In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. A gas seal is formed between said structure and the surface of said substrate to contain liquid in the space.