公开(公告)号：US20230333487A1

公开(公告)日：2023-10-19

申请号：US17914903

申请日：2021-04-01

Applicant: ASML NETHERLANDS B.V.

Inventor： Rob Johan Theodoor RUTTEN ,  Ruud Hendrikus Martinus Johannes BLOKS ,  Alexandrios MATHEW ,  Ron VENNIX

IPC: G03F7/00

CPC classification number: G03F7/706835 ,  G03F7/7085 ,  G03F7/70858 ,  G03F7/70933 ,  G03F7/706843

Abstract: A system for measuring a beam. The system includes a measurement device configured to measure the beam and determine a signal based on the measured beam, and a fluid supply device configured to provide fluid as a fluid stream to, or surrounding, the beam. The system is configured to calculate noise of the signal, and to adjust a parameter of the fluid of the fluid stream to reduce the calculated noise.

公开(公告)号：US20170199470A1

公开(公告)日：2017-07-13

申请号：US15327343

申请日：2015-06-23

Applicant: ASML NETHERLANDS B.V.

Inventor： Jan Steven Christiaan WESTERLAKEN ,  Alexandrios MATHEW ,  Rob Johan Theodoor RUTTEN

IPC: G03F7/20

CPC classification number: G03F7/70866 ,  G03F7/70341 ,  G03F7/70858 ,  G05D23/1934

Abstract: A conditioning system for a lithographic apparatus having a plurality of modules. The conditioning system includes a plurality of conditioning branches conveying a common conditioning medium for the plurality of modules, one conditioning branch for each module (or a subset of modules); a plurality of thermal actuators, each thermal actuator operable to locally alter the temperature of the common conditioning medium at one of the conditioning branches; and a plurality of sensors, each sensor operable to sense the temperature of the common conditioning medium at one of the conditioning branches.