公开(公告)号：US20180113389A1

公开(公告)日：2018-04-26

申请号：US15567252

申请日：2016-03-09

Applicant: ASML NETHERLANDS B.V.

Inventor： Johannes Pieter KROES ,  Kevin Nicolas Stephan COUTEAU ,  Rachid EL BOUBSI ,  Rob Johan Theodoor RUTTEN ,  Patrick Johannes Cornelus Hendrik SMULDERS ,  Martijn Lambertus Peter VISSER ,  Jan Steven Christiaan WESTERLAKEN

IPC: G03F7/20

CPC classification number: G03F7/70908 ,  G03F7/70716

Abstract: An apparatus has a first component with a first surface and a second component with a second surface, wherein the first and second components can undergo relative movement. The first surface and the second surface face each other. The first surface accommodates a barrier system to provide a barrier to reduce or prevent an inflow of ambient gas into a protected volume of gas between the first and second surfaces. The barrier system includes a curtain opening adapted for a flow of curtain gas therefrom for establishing a gas curtain enclosing part of the protected volume, and an inner entrainment opening, located inward of the curtain opening with respect to the protected volume, adapted for a flow of inner entrainment gas therefrom for being entrained into the flow of curtain gas. The apparatus is configured such that the inner entrainment gas flow is less turbulent than the curtain gas flow.

公开(公告)号：US20230333487A1

公开(公告)日：2023-10-19

申请号：US17914903

申请日：2021-04-01

Applicant: ASML NETHERLANDS B.V.

Inventor： Rob Johan Theodoor RUTTEN ,  Ruud Hendrikus Martinus Johannes BLOKS ,  Alexandrios MATHEW ,  Ron VENNIX

IPC: G03F7/00

CPC classification number: G03F7/706835 ,  G03F7/7085 ,  G03F7/70858 ,  G03F7/70933 ,  G03F7/706843

Abstract: A system for measuring a beam. The system includes a measurement device configured to measure the beam and determine a signal based on the measured beam, and a fluid supply device configured to provide fluid as a fluid stream to, or surrounding, the beam. The system is configured to calculate noise of the signal, and to adjust a parameter of the fluid of the fluid stream to reduce the calculated noise.

公开(公告)号：US20170199470A1

公开(公告)日：2017-07-13

申请号：US15327343

申请日：2015-06-23

Applicant: ASML NETHERLANDS B.V.

Inventor： Jan Steven Christiaan WESTERLAKEN ,  Alexandrios MATHEW ,  Rob Johan Theodoor RUTTEN

IPC: G03F7/20

CPC classification number: G03F7/70866 ,  G03F7/70341 ,  G03F7/70858 ,  G05D23/1934

Abstract: A conditioning system for a lithographic apparatus having a plurality of modules. The conditioning system includes a plurality of conditioning branches conveying a common conditioning medium for the plurality of modules, one conditioning branch for each module (or a subset of modules); a plurality of thermal actuators, each thermal actuator operable to locally alter the temperature of the common conditioning medium at one of the conditioning branches; and a plurality of sensors, each sensor operable to sense the temperature of the common conditioning medium at one of the conditioning branches.