公开(公告)号：US20210247698A1

公开(公告)日：2021-08-12

申请号：US16973732

申请日：2019-06-11

Applicant: ASML NETHERLANDS B.V.

Inventor： Bart SMEETS ,  Anita BOUMA ,  Johannes Jacobus Matheus BASELMANS ,  Birgitt Noelle Cornelia Liduine HEPP ,  Paulus Hubertus Petrus KOLLER ,  Carsten Andreas KÖHLER

IPC: G03F7/20 ,  G03F7/00

Abstract: A method for tuning a target apparatus of a patterning process. The method includes obtaining a reference performance, and measurement data of a substrate subjected to the patterning process at the target apparatus, the measurement data indicative of a performance of the target apparatus; determining a cause of a performance mismatch based on a difference between the reference performance and the performance of the target apparatus, wherein the cause includes an optical characteristic; and responsive to the cause, adjusting an optical parameter associated with an adjustable optical characteristic to reduce the performance mismatch in the optical characteristic.