Lithographic Method and Apparatus
    6.
    发明申请
    Lithographic Method and Apparatus 有权
    平版印刷方法和装置

    公开(公告)号:US20160274462A1

    公开(公告)日:2016-09-22

    申请号:US15032245

    申请日:2014-10-02

    Abstract: A method of correcting an optical image formed by an optical system, the method including obtaining a map indicative of a polarization dependent property of the optical system across a pupil plane of the optical system for each spatial position in an image plane of the optical system, combining the map indicative of the polarization dependent property of the optical system with a radiation map of the intensity and polarization of an input radiation beam to form an image map, and using the image map to correct an optical image formed by directing the input radiation beam through the optical system.

    Abstract translation: 一种校正由光学系统形成的光学图像的方法,所述方法包括在所述光学系统的图像平面中的每个空间位置获得指示所述光学系统的光瞳平面上的所述光学系统的偏振度相关特性的映射, 将表示光学系统的偏振相关属性的映射与输入辐射束的强度和偏振的辐射图组合以形成图像映射,并且使用图像映射来校正通过引导输入辐射束形成的光学图像 通过光学系统。

Patent Agency Ranking