公开(公告)号：WO2019057578A1

公开(公告)日：2019-03-28

申请号：PCT/EP2018/074575

申请日：2018-09-12

Applicant: ASML NETHERLANDS B.V.

Inventor： JAK, Martin, Jacobus, Johan ,  MATHIJSSEN, Simon, Gijsbert, Josephus ,  BHATTACHARYYA, Kaustuve ,  JANG, Won-Jae ,  BYUN, Jinmoo

IPC: G03F7/20

Abstract: A method to determine a patterning process parameter, the method comprising: for a target, calculating a first value for an intermediate parameter from data obtained by illuminating the target with radiation comprising a central wavelength; for the target, calculating a second value for the intermediate parameter from data obtained by illuminating the target with radiation comprising two different central wavelengths; and calculating a combined measurement for the patterning process parameter based on the first and second values for the intermediate parameter.