公开(公告)号：US20220291593A1

公开(公告)日：2022-09-15

申请号：US17639364

申请日：2020-08-05

Applicant: ASML NETHERLANDS B.V.

Inventor： Roy WERKMAN ,  Pui Leng LAM ,  Blandine Marie Andree Richit MINGHETTI ,  Vahid BASTANI ,  Mohamadrezh HAJIAHMADI ,  Lydia Marianna VERGAIJ-HUIZER ,  Frans Reinier SPIERING

IPC: G03F7/20 ,  G03F1/42

Abstract: A method for characterizing a patterning process, the method including obtaining a plurality of values of stitching errors made along one or more boundaries between at least two patterned adjacent fields or sub-fields on a substrate; and fitting, using a hardware computer system, a distortion model to the plurality of values to obtain a fingerprint representing deformation of a field or sub-field out of the at least two patterned adjacent fields or sub-fields.