PELLICLE FRAME FOR EUV LITHOGRAPHY
    1.
    发明申请

    公开(公告)号:WO2021213777A1

    公开(公告)日:2021-10-28

    申请号:PCT/EP2021/057742

    申请日:2021-03-25

    Abstract: A pellicle frame (17) comprises: a first portion (40); and a plurality of second portions (42). The first portion is for connection to a border (19a) of a pellicle (19). The first portion comprises a hollow and generally rectangular body. The plurality of second portions are for connection to a patterning device (MA). The first portion and the plurality of second portions are all formed from a first material. Each of the second portions is connected to the first portion by a spring portion (44) formed from the first material. Such a pellicle frame is advantageous since the first portion, the plurality of second portions and the spring portions are all formed from the same material. This significantly simplifies the manufacture of the pellicle frame. For example, all parts of the pellicle frame may be integrally formed together.

Patent Agency Ranking