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公开(公告)号：WO2021250074A1
公开(公告)日：2021-12-16
申请号：PCT/EP2021/065418
申请日：2021-06-09
Applicant: ASML NETHERLANDS B.V. , ASML HOLDING N.V.
Inventor： VAN DE VEN, Bastiaan, Lambertus, Wilhelmus, Marinus , VAN BERKEL, Koos , VAN DE KERKHOF, Marcus, Adrianus , HAMELINCK, Roger, Franciscus, Mattheus, Maria , SHERVIN, Shahab , VERSCHUREN, Marinus, Augustinus, Christiaan , ENGELEN, Johannes, Bernardus, Charles , KRUIZINGA, Matthias , UITTERDIJK, Tammo , GALAKTIONOV, Oleksiy, Sergiyovich , JANSSEN, Kjeld, Gertrudus, Hendrikus , PIJNENBURG, Johannes, Adrianus, Cornelis, Maria , VAN DELFT, Peter
IPC: G03F7/20 , G03F7/70708
Abstract: An object holder configured to support an object, the object holder comprising: a core body comprising a plurality of burls having distal ends in a support plane for supporting the object; an electrostatic sheet between the burls, the electrostatic sheet comprising an electrode sandwiched between dielectric layers; and a circumferential barrier for reducing outflow of gas escaping from a space between the object and the core body.
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公开(公告)号：WO2017186486A1
公开(公告)日：2017-11-02
申请号：PCT/EP2017/058721
申请日：2017-04-12
Applicant: ASML NETHERLANDS B.V.
Inventor： NASALEVICH, Maxim, Aleksandrovich , ABEGG, Erik, Achilles , BANERJEE, Nirupam , BLAUW, Michiel, Alexander , BROUNS, Derk, Servatius, Gertruda , JANSSEN, Paul , KRUIZINGA, Matthias , LENDERINK, Egbert , MAXIM, Nicolae , NIKIPELOV, Andrey , NOTENBOOM, Arnoud, Willem , PILIEGO, Claudia , PÉTER, Mária , RISPENS, Gijsbert , SCHUH, Nadja , VAN DE KERKHOF, Marcus, Adrianus , VAN DER ZANDE, Willem, Joan , VAN ZWOL, Pieter-Jan , VERBURG, Antonius, Willem , VERMEULEN, Johannes, Petrus, Martinus, Bernardus , VLES, David, Ferdinand , VOORTHUIJZEN, Willem-Pieter , ZDRAVKOV, Alexandar, Nikolov
Abstract: Membranes for EUV lithography are disclosed. In one arrangement, a membrane comprises a stack having layers in the following order: a first capping layer comprising an oxide of a first metal; a base layer comprising a compound comprising a second metal and an additional element selected from the group consisting of Si, B, C and N; and a second capping layer comprising an oxide of a third metal, wherein the first metal is different from the second metal and the third metal is the same as or different from the first metal.
Abstract translation: 公开了用于EUV光刻的膜。 在一种布置中，膜包括具有以下顺序的层的堆叠体：包含第一金属的氧化物的第一封盖层; 基层，其包含含有第二金属和选自Si，B，C和N的附加元素的化合物; 以及包含第三金属的氧化物的第二覆盖层，其中第一金属不同于第二金属，第三金属与第一金属相同或不同。
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公开(公告)号：WO2021213777A1
公开(公告)日：2021-10-28
申请号：PCT/EP2021/057742
申请日：2021-03-25
Applicant: ASML NETHERLANDS B.V.
Inventor： CUSTERS, Kristof , DE BRUIJN, Ron, Geeraard, Catharina , KRUIZINGA, Matthias , SCHIJVENAARS, Lodewijk, Alexander
IPC: G03F1/64
Abstract: A pellicle frame (17) comprises: a first portion (40); and a plurality of second portions (42). The first portion is for connection to a border (19a) of a pellicle (19). The first portion comprises a hollow and generally rectangular body. The plurality of second portions are for connection to a patterning device (MA). The first portion and the plurality of second portions are all formed from a first material. Each of the second portions is connected to the first portion by a spring portion (44) formed from the first material. Such a pellicle frame is advantageous since the first portion, the plurality of second portions and the spring portions are all formed from the same material. This significantly simplifies the manufacture of the pellicle frame. For example, all parts of the pellicle frame may be integrally formed together.
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公开(公告)号：WO2016079052A2
公开(公告)日：2016-05-26
申请号：PCT/EP2015/076688
申请日：2015-11-16
Applicant: ASML NETHERLANDS B.V.
Inventor： VAN DER MEULEN, Frits , JANSEN, Maarten, Mathijs, Marinus , AZEREDO LIMA, Jorge, Manuel , BROUNS, Derk, Servatius, Gertruda , BRUIJN, Marc , DEKKERS, Jeroen , JANSSEN, Paul , KRAMER, Ronald, Harm, Gunther , KRUIZINGA, Matthias , LANSBERGEN, Robert, Gabriël, Maria , LEENDERS, Martinus, Hendrikus, Antonius , LOOPSTRA, Erik, Roelof , VAN DEN BOSCH, Gerrit , VAN LOO, Jérôme, François, Sylvain, Virgile , VERBRUGGE, Beatrijs, Louise, Marie-Joseph, Katrien , DE KLERK, Angelo, Cesar, Peter , DINGS, Jacobus, Maria , JANSSEN, Maurice, Leonardus, Johannes , KERSTENS, Roland, Jacobus, Johannes , KESTERS, Martinus, Jozef, Maria , LOOS, Michel , MIDDEL, Geert , REIJNDERS, Silvester, Matheus , THEUERZEIT, Frank, Johannes, Christiaan , VAN LIEVENOOGEN, Anne, Johannes, Wilhelmus
CPC classification number: G03F7/70983 , G03F1/64 , G03F7/70825
Abstract: Tooling for a mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.
Abstract translation: 用于适用于光刻工艺的掩模组件的工具，所述掩模组件包括图案形成装置; 以及被配置为支撑薄膜并用安装件安装在所述图案形成装置上的薄膜框架; 其中所述安装件提供图案形成装置和薄膜框架之间的可释放地可接合的附接。
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公开(公告)号：WO2023016738A1
公开(公告)日：2023-02-16
申请号：PCT/EP2022/069567
申请日：2022-07-13
Applicant: ASML NETHERLANDS B.V.
Inventor： GUAN, Tiannan , HUANG, Zhuangxiong , ENGELEN, Johannes, Bernardus, Charles , NAKIBOGLU, Günes , KRUIZINGA, Matthias , VAN GILS, Petrus, Jacobus, Maria , TRALLI, Aldo , DE VRIES, Sjoerd, Frans , TEUNISSEN, Marcel, Maria, Cornelius, Franciscus , BRULS, Richard, Joseph , VAN DER MEULEN, Frits
IPC: G03F7/20 , H01L21/683
Abstract: The invention relates to an electrostatic holder comprising: a body, and a clamping element attached to the body, said clamping element comprising an electrode for applying an attractive force between the clamping element and a first to be clamped object, wherein an outer edge of the body is configured to provide a gap between the outer edge of the body and the first to be clamped object, which gap is configured for outputting a fluid for reducing dust particles reaching the first to be clamped object or a second to be clamped object on an opposite side of the holder.
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Patent Agency Ranking
公开(公告)号：WO2016124536A2
公开(公告)日：2016-08-11
申请号：PCT/EP2016/052055
申请日：2016-02-01
Applicant: ASML NETHERLANDS B.V.
Inventor： BROUNS, Derk, Servatius, Gertruda , DE GRAAF, Dennis , DE KRUIF, Robertus, Cornelis, Martinus , JANSSEN, Paul , KRUIZINGA, Matthias , NOTENBOOM, Arnoud, Willem , SMITH, Daniel, Andrew , VERBRUGGE, Beatrijs, Louise, Marie-Joseph, Katrien , WILEY, James, Norman
Abstract: A method comprising the steps of receiving a mask assembly comprising a mask and a removable EUV transparent pellicle held by a pellicle frame, removing the pellicle frame and EUV transparent pellicle from the mask, using an inspection tool to inspect the mask pattern on the mask, and subsequently attaching to the mask an EUV transparent pellicle held by a pellicle frame. The method may also comprise the following steps: after removing the pellicle frame and EUV transparent pellicle from the mask, attaching to the mask an alternative pellicle frame holding an alternative pellicle formed from a material which is substantially transparent to an inspection beam of the inspection tool; and after using an inspection tool to inspect the mask pattern on the mask, removing the alternative pellicle held by the alternative pellicle frame from the mask in order to attach to the mask the EUV transparent pellicle held by the pellicle frame.
Abstract translation: 一种方法，包括以下步骤：接收包括掩模和由防护薄膜框架保持的可去除EUV透明防护薄膜组件的掩模组件，使用检查工具从掩模中去除防护薄膜框架和EUV透明防护薄膜，以检查掩模上的掩模图案， 随后将由防护薄膜组件框架保持的EUV透明防护薄膜组件附接到掩模。 该方法还可以包括以下步骤：在从掩模移除防护薄膜组件框架和EUV透明防护薄膜组件之后，将掩模框架固定在保护由检查工具的检查梁基本透明的材料形成的替代防护薄膜组件 ; 并且在使用检查工具检查掩模上的掩模图案之后，将由替代的防护薄膜框架保持的替代防护薄膜组件从掩模中取出，以便将由防护膜框架保持的EUV透明防护薄膜组件附着到掩模上。
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公开(公告)号：WO2016079051A2
公开(公告)日：2016-05-26
申请号：PCT/EP2015/076687
申请日：2015-11-16
Applicant: ASML NETHERLANDS B.V. , ASML HOLDING N.V.
Inventor： KRUIZINGA, Matthias , JANSEN, Maarten, Mathijs, Marinus , AZEREDO LIMA, Jorge, Manuel , BOGAART, Erik, Willem , BROUNS, Derk, Servatius, Gertruda , BRUIJN, Marc , BRULS, Richard, Joseph , DEKKERS, Jeroen , JANSSEN, Paul , KAMALI, Mohammad, Reza , KRAMER, Ronald, Harm, Gunther , LANSBERGEN, Robert, Gabriël, Maria , LEENDERS, Martinus, Hendrikus, Antonius , LIPSON, Matthew , LOOPSTRA, Erik, Roelof , LYONS, Joseph, H. , ROUX, Stephen , VAN DEN BOSCH, Gerrit , VAN DEN HEIJKANT, Sander , VAN DER GRAAF, Sandra , VAN DER MEULEN, Frits , VAN LOO, Jérôme, François, Sylvain, Virgile , VERBRUGGE, Beatrijs, Louise, Marie-Joseph, Katrien
IPC: G03F1/62
CPC classification number: G03F7/70983 , G03F1/64 , G03F7/70825
Abstract: A mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount is configured to suspend the pellicle frame relative to the patterning device such that there is a gap between the pellicle frame and the patterning device; and wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.
Abstract translation: 一种适用于光刻工艺的掩模组件，所述掩模组件包括图案形成装置; 以及防护薄膜组件框架，其被配置为支撑防护薄膜组件并且用安装件安装在所述图案形成装置上; 其中所述安装件被配置为相对于所述图案形成装置悬挂所述防护薄膜框架，使得所述防护薄膜框架和所述图案形成装置之间存在间隙; 并且其中所述安装件在所述图案形成装置和所述防护膜框架之间提供可释放地接合的附接。
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公开(公告)号：EP3449312A1
公开(公告)日：2019-03-06
申请号：EP17717149.3
申请日：2017-04-12
Applicant: ASML Netherlands B.V.
Inventor： NASALEVICH, Maxim, Aleksandrovich , ABEGG, Erik, Achilles , BANERJEE, Nirupam , BLAUW, Michiel, Alexander , BROUNS, Derk, Servatius, Gertruda , JANSSEN, Paul , KRUIZINGA, Matthias , LENDERINK, Egbert , MAXIM, Nicolae , NIKIPELOV, Andrey , NOTENBOOM, Arnoud, Willem , PILIEGO, Claudia , PÉTER, Mária , RISPENS, Gijsbert , SCHUH, Nadja , VAN DE KERKHOF, Marcus, Adrianus , VAN DER ZANDE, Willem, Joan , VAN ZWOL, Pieter-Jan , VERBURG, Antonius, Willem , VERMEULEN, Johannes, Petrus, Martinus, Bernardus , VLES, David, Ferdinand , VOORTHUIJZEN, Willem-Pieter , ZDRAVKOV, Alexandar, Nikolov
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公开(公告)号：EP3221748A2
公开(公告)日：2017-09-27
申请号：EP15794923.1
申请日：2015-11-16
Applicant: ASML Netherlands B.V.
Inventor： VAN DER MEULEN, Frits , JANSEN, Maarten Mathijs Marinus , AZEREDO LIMA, Jorge Manuel , BROUNS, Derk Servatius Gertruda , BRUIJN, Marc , DEKKERS, Jeroen , JANSSEN, Paul , KRAMER, Ronald Harm Gunther , KRUIZINGA, Matthias , LANSBERGEN, Robert Gabriël Maria , LEENDERS, Martinus Hendrikus Antonius , LOOPSTRA, Erik Roelof , VAN DEN BOSCH, Gerrit , VAN LOO, Jérôme François Sylvain Virgile , VERBRUGGE, Beatrijs Louise Marie-Joseph Katrien , DE KLERK, Angelo Cesar Peter , DINGS, Jacobus Maria , JANSSEN, Maurice Leonardus Johannes , KERSTENS, Roland Jacobus Johannes , KESTERS, Martinus Jozef Maria , LOOS, Michel , MIDDEL, Geert , REIJNDERS, Silvester Matheus , THEUERZEIT, Frank Johannes Christiaan , VAN LIEVENOOGEN, Anne Johannes Wilhelmus
CPC classification number: G03F7/70983 , G03F1/64 , G03F7/70825
Abstract: Tooling for a mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.
Abstract translation: 用于适用于光刻工艺的掩模组件的工具，所述掩模组件包括图案形成装置; 以及被配置为支撑薄膜并用安装件安装在所述图案形成装置上的薄膜框架; 其中所述安装件在所述图案形成装置和所述薄膜框架之间提供可释放地接合的附接。
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公开(公告)号：EP4160315A1
公开(公告)日：2023-04-05
申请号：EP22202401.0
申请日：2016-02-01
Applicant: ASML Netherlands B.V.
Inventor： BROUNS, Derk, Servatius, Gertruda , DE GRAAF, Dennis , DE KRUIF, Robertus, Cornelis, Martinus , JANSSEN, Paul , KRUIZINGA, Matthias , NOTENBOOM, Arnoud, Willem , SMITH, Daniel, Andrew , VERBRUGGE, Beatrijs, Louise, Marie-Joseph, Katrien , WILEY, James, Norman
Abstract: A method comprising the steps of receiving a mask assembly comprising a mask and a removable EUV transparent pellicle held by a pellicle frame, removing the pellicle frame and EUV transparent pellicle from the mask, using an inspection tool to inspect the mask pattern on the mask, and subsequently attaching to the mask an EUV transparent pellicle held by a pellicle frame. The method may also comprise the following steps: after removing the pellicle frame and EUV transparent pellicle from the mask, attaching to the mask an alternative pellicle frame holding an alternative pellicle formed from a material which is substantially transparent to an inspection beam of the inspection tool; and after using an inspection tool to inspect the mask pattern on the mask, removing the alternative pellicle held by the alternative pellicle frame from the mask in order to attach to the mask the EUV transparent pellicle held by the pellicle frame.
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