公开(公告)号：WO2015193053A1

公开(公告)日：2015-12-23

申请号：PCT/EP2015/061193

申请日：2015-05-21

Applicant: ASML NETHERLANDS B.V.

Inventor： DE WIT, Paul ,  DE VOS, Youssef ,  HEMPENIUS, Peter ,  KEMPER, Nicolaas ,  RIJS, Robertus, Mathijs, Gerardus ,  VAN DER MEULEN, Frits ,  BOERE, Stijne

IPC: G03F7/20

CPC classification number: G03F9/7073 ,  G03F7/20 ,  G03F7/70725 ,  G03F7/70875 ,  G03F7/70891 ,  G03F7/709

Abstract: The invention relates to providing a temperature conditioning system for a lithographic apparatus. Temperature variations in an object cause object deformation which prevents the object being accurately positioned. Temperature condition systems use conduit systems, provided with fluid, in or on the object to control the temperature of the object to reduce object deformation. In this way, parts of the object can be more accurately positioned. However, acceleration of the object and the temperature conditioning system induces variation in pressure within the fluid inside the conduit system on or in the object, which may also cause object deformation. To provide an improved conduit system, the lithographic apparatus further comprises a control system which is used to control the movement of the object based on measurements indicating pressure variation in the conduit.

Abstract translation: 本发明涉及提供一种用于光刻设备的温度调节系统。 物体中的温度变化导致物体变形，从而防止物体被精确定位。 温度条件系统使用在物体中或物体上提供流体的管道系统来控制物体的温度以减少物体变形。 以这种方式，可以更准确地定位物体的部分。 然而，物体和温度调节系统的加速度导致管道系统内部或物体内的流体内的压力变化，这也可能导致物体变形。 为了提供改进的导管系统，光刻设备还包括控制系统，其用于基于指示导管中的压力变化的测量来控制物体的移动。

公开(公告)号：WO2021249784A1

公开(公告)日：2021-12-16

申请号：PCT/EP2021/064255

申请日：2021-05-27

Applicant: ASML NETHERLANDS B.V.

Inventor： KEULEN, Luuc ,  GOSEN, Jeroen, Gerard ,  VAN BANNING, Dennis, Herman, Caspar ,  ARORA, Sampann ,  RONDE, Michaël, Johannes, Christiaan ,  KUINDERSMA, Lucas ,  DE VOS, Youssef ,  VAN DE GROES, Henricus, Martinus, Johannes ,  KOOIKER, Allard, Eelco ,  PRIL, Wouter, Onno ,  VAN GEND, Johan

IPC: G03F7/20 ,  G03F7/70716 ,  G03F7/70775 ,  G03F7/70883 ,  G03F7/70933

Abstract: The invention provides an apparatus for use in a metrology process or a lithographic process, the apparatus comprising: an object support module adapted to hold an object; a first gas shower arranged on a first side of the object support module and adapted to emit a gas with a first velocity in a first gas direction which is a horizontal direction to cause a net gas flow in the apparatus to be a substantially horizontal gas flow in the first gas direction at least above the object support module.