公开(公告)号：WO2017080823A1

公开(公告)日：2017-05-18

申请号：PCT/EP2016/075769

申请日：2016-10-26

Applicant: ASML NETHERLANDS B.V.

Inventor： VAN LANKVELT, Alexander, Petrus, Josephus ,  KERP, Ingmar, August ,  OOSTVEEN, Richardus, Simon, Antonius ,  OUDE NIJHUIS, Marco, Hendrikus, Hermanus ,  RIJS, Robertus, Mathijs, Gerardus ,  SEIJGER, Olav, Johannes ,  STEENHOEK, Alexander, Maurice

IPC: G03F7/20 ,  F16F15/02 ,  F16J15/52

CPC classification number: G03F7/709 ,  F16F15/02 ,  F16J15/52 ,  G03F7/70825

Abstract: The invention relates to a vibration isolation system (VIS) comprising: - a base (10); - a coupling element (20) to be coupled to a vibration sensitive object; - a vibration isolator (30-34) arranged between the base and the coupling element; - a bellows (50) to be arranged between the coupling element or the vibration isolator and a protective housing (40) surrounding the vibration sensitive object; and - one or more separate damping elements to act on convolutions of the bellow,

Abstract translation: 本发明涉及一种隔振系统（VIS），包括： - 基座（10）;以及 - 基座 - 耦合到振动敏感物体的耦合元件（20） - 设置在基座和联接元件之间的隔振器（30-34） - 波纹管（50），其布置在所述耦合元件或所述隔振器与围绕所述振动敏感物体的保护壳体（40）之间; 和 - 一个或多个单独的阻尼元件作用于波纹管的卷绕，

公开(公告)号：WO2015193053A1

公开(公告)日：2015-12-23

申请号：PCT/EP2015/061193

申请日：2015-05-21

Applicant: ASML NETHERLANDS B.V.

Inventor： DE WIT, Paul ,  DE VOS, Youssef ,  HEMPENIUS, Peter ,  KEMPER, Nicolaas ,  RIJS, Robertus, Mathijs, Gerardus ,  VAN DER MEULEN, Frits ,  BOERE, Stijne

IPC: G03F7/20

CPC classification number: G03F9/7073 ,  G03F7/20 ,  G03F7/70725 ,  G03F7/70875 ,  G03F7/70891 ,  G03F7/709

Abstract: The invention relates to providing a temperature conditioning system for a lithographic apparatus. Temperature variations in an object cause object deformation which prevents the object being accurately positioned. Temperature condition systems use conduit systems, provided with fluid, in or on the object to control the temperature of the object to reduce object deformation. In this way, parts of the object can be more accurately positioned. However, acceleration of the object and the temperature conditioning system induces variation in pressure within the fluid inside the conduit system on or in the object, which may also cause object deformation. To provide an improved conduit system, the lithographic apparatus further comprises a control system which is used to control the movement of the object based on measurements indicating pressure variation in the conduit.

Abstract translation: 本发明涉及提供一种用于光刻设备的温度调节系统。 物体中的温度变化导致物体变形，从而防止物体被精确定位。 温度条件系统使用在物体中或物体上提供流体的管道系统来控制物体的温度以减少物体变形。 以这种方式，可以更准确地定位物体的部分。 然而，物体和温度调节系统的加速度导致管道系统内部或物体内的流体内的压力变化，这也可能导致物体变形。 为了提供改进的导管系统，光刻设备还包括控制系统，其用于基于指示导管中的压力变化的测量来控制物体的移动。

公开(公告)号：WO2015185320A1

公开(公告)日：2015-12-10

申请号：PCT/EP2015/060096

申请日：2015-05-07

Applicant: ASML NETHERLANDS B.V.

Inventor： NAKIBOGLU, Günes ,  BAGGEN, Mark, Constant, Johannes ,  BOOGAARD, Gerard, Johannes ,  COX, Henrikus, Herman, Marie ,  KEMPER, Nicolaas, Rudolf ,  KERSSEMAKERS, Sander ,  RIJS, Robertus, Mathijs, Gerardus ,  VAN BOXTEL, Frank, Johannes, Jacobus ,  VAN DEN BOOGAERT, Erwin, Antonius, Henricus, Franciscus ,  VAN DER WIJST, Marc, Wilhelmus, Maria ,  VAN DUIJNHOVEN, Martinus ,  VERDONSCHOT, Jessica, Henrica, Anna

IPC: G03F7/20

CPC classification number: G03F7/709 ,  G10K11/16 ,  G10K11/168 ,  G10K11/172

Abstract: A lithographic apparatus has a compartment which accommodates a movable object. Movements of the movable object cause acoustic disturbances in the compartment. An acoustic damper is arranged to damp the acoustic disturbances in the compartment and comprises a chamber (100) in communication with the compartment and a perforated plate (101), having a plurality of through-holes (102), between the chamber and the compartment.

Abstract translation: 光刻设备具有容纳可移动物体的隔间。 可移动物体的运动引起隔室中的声学干扰。 声阻尼器布置成阻尼隔室中的声学干扰，并且包括与隔室连通的腔室（100）和多孔板（101），其具有多个通孔（102），位于腔室和隔间 。

公开(公告)号：WO2015090753A1

公开(公告)日：2015-06-25

申请号：PCT/EP2014/074583

申请日：2014-11-14

Applicant: ASML NETHERLANDS B.V.

Inventor： HEMPENIUS, Peter, Paul ,  HOUBEN, Martijn ,  KEMPER, Nicolaas, Rudolf ,  RIJS, Robertus, Mathijs, Gerardus ,  DE WIT, Paul, Corné, Henri ,  BOERE, Stijn, Willem ,  DE VOS, Youssef, Karel, Maria ,  VAN DER MEULEN, Frits

IPC: G03F7/20

CPC classification number: G03F7/70875 ,  G03F7/70775 ,  G03F7/709

Abstract: The invention relates to a lithographic apparatus comprising: - an object (OB) that is moveable in at least one direction (X, Y); - a control system to move the object in the at least one direction, wherein the control system is arranged to control movement of the object in the at least one direction in a frequency range of interest; - a conduit (CC) provided with a fluid (CF); wherein the conduit is arranged on or in the object in a pattern, wherein the pattern is such that an acceleration of the object in the at least one direction causes an acceleration pressure profile in the fluid along the conduit, wherein the acceleration pressure profile does not match with a resonance pressure profile that corresponds to a standing wave mode in the fluid with a resonance frequency in the frequency range of interest.

Abstract translation: 本发明涉及一种光刻设备，包括： - 可在至少一个方向（X，Y）上移动的物体（OB）; - 控制系统，用于在所述至少一个方向上移动所述物体，其中所述控制系统被布置成控制所述物体在感兴趣的频率范围内的所述至少一个方向上的移动; - 设有流体（CF）的管道（CC）; 其中所述导管以图案布置在所述物体上或所述物体中，其中所述图案使得所述物体在所述至少一个方向上的加速度导致沿着所述导管的所述流体中的加速度压力分布，其中所述加速度压力分布不 与在感兴趣的频率范围内具有共振频率的流体中的驻波模式相对应的共振压力分布匹配。

公开(公告)号：WO2013113632A3

公开(公告)日：2013-08-08

申请号：PCT/EP2013/051472

申请日：2013-01-25

Applicant: ASML NETHERLANDS B.V. ,  KONINKLIJKE PHILIPS ELECTRONICS N.V.

Inventor： VAN DE VEN, Bastiaan, Lambertus, Wilhelmus ,  DE GROOT, Antonius, Franciscus, Johannes ,  VERMEULEN, Johannes, Petrus, Martinus, Bernardus ,  CADEE, Theodorus, Petrus, Maria ,  RIJS, Robertus, Mathijs, Gerardus ,  VAN LIESHOUT, Richard, Henricus, Adrianus

IPC: G03F7/20

Abstract: A movable stage system is configured to support an object subjected to a lithography process. A short stroke part (SS) is configured to support the object (W) and a long stroke part (LS) is configured to support the short stroke part. The short stroke part is movable over a relative small range of movement with respect to the long stroke part. The long stroke part is movable over a relative large range of movement with respect to a base support arranged to support the long stroke part. A shielding element (SE) is arranged between the short and long stroke parts. A position control system (PCS) maintains a substantially constant distance between the shielding element and the short stroke part.