公开(公告)号：US20190011841A1

公开(公告)日：2019-01-10

申请号：US16064274

申请日：2016-12-13

Applicant: ASML NETHERLANDS B.V.

Inventor： Pieter Willem Herman DE JAGER ,  Coen Adrianus VERSCHUREN ,  Erwin Paul SMAKMAN ,  Erwin JOhn VAN ZWET ,  Wouter Frans Willem MULCKHUYSE ,  Pieter VERHOEFF ,  Robert Albertus Johannes VAN DER WERF

IPC: G03F7/20

Abstract: An exposure apparatus including: a substrate holder constructed to support a substrate; a patterning device configured to provide radiation modulated according to a desired pattern, the patterning device including a plurality of two-dimensional arrays of radiation sources, each radiation source configured to emit a radiation beam; a projection system configured to project the modulated radiation onto the substrate, the projection system including a plurality of optical elements arranged side by side and arranged such that a two-dimensional array of radiation beams from a two-dimensional array of radiation sources impinges a single optical element of the plurality of optical elements; and an actuator configured to provide relative motion between the substrate and the plurality of two-dimensional arrays of radiation sources in a scanning direction to expose the substrate.