公开(公告)号：US20230082858A1

公开(公告)日：2023-03-16

申请号：US17797506

申请日：2021-01-14

Applicant: ASML NETHERLANDS B.V.

Inventor： Jochem Sebastiaan WILDENBERG ,  Hermanus Adrianus DILLEN ,  Fan FENG ,  Ronald VAN ITTERSUM ,  Willem Louis VAN MIERLO ,  Koen THUIJS

IPC: G03F7/20

Abstract: A method and associated apparatuses for controlling a process of manufacturing semiconductor devices on a substrate. The method includes obtaining process data relating to the process and determining a correction for the process based on the process data and a first control objective associated with the devices on the substrate. A first probability of the first control objective being achievable is determined and the correction adjusted based on the probability and at least a second control objective having a second probability of being achievable compared to the first control objective.