公开(公告)号：US20190101837A1

公开(公告)日：2019-04-04

申请号：US16086343

申请日：2017-02-16

Applicant: ASML NETHERLANDS B.V.

Inventor： Hakki Ergün CEKLI ,  Günes NAKÍBOGLU ,  Frank Johannes Jacobus ,  Jean-Philippe XAVIER ,  Richard Johannes Franciscus

IPC: G03F7/20

Abstract: A patterning device cooling system for thermally conditioning a patterning device of a lithographic apparatus, wherein the patterning device in use, is being irradiated by exposure radiation, wherein the patterning device cooling system has: a thermal conditioner configured to thermally condition the patterning device; and a controller configured to control the thermal conditioner to thermally condition the patterning device dependent on an amount of the exposure radiation absorbed by the patterning device.