公开(公告)号：WO2015154917A1

公开(公告)日：2015-10-15

申请号：PCT/EP2015/054277

申请日：2015-03-02

Applicant: ASML NETHERLANDS B.V.

Inventor： VAN DER WILK, Ronald ,  GOORHUIS, Ger-Wim Jan

IPC: G03F7/20

CPC classification number: G03F7/70925 ,  H01L21/67028

Abstract: An apparatus for cleaning an object (W), the apparatus comprising: an object support (16) for supporting the object; a low pressure chamber (15) for exposing a first surface of the object to a low pressure when the object is arranged on the object support, an electrode (23a, 23b) arranged adjacent to and separated from the first surface of the object when the object is arranged on the object support, the electrode being in electrical communication with a surface of the object support which is adjacent the first surface of the object; and a power supply (24a, 24b) arranged to apply a voltage between the electrode and the object; thereby generating a discharge between the object and the electrode.

Abstract translation: 一种用于清洁物体（W）的装置，所述装置包括：用于支撑物体的物体支撑件（16）; 当所述物体被布置在所述物体支撑件上时，用于将所述物体的第一表面暴露于低压的低压室（15），当所述物体被布置在所述物体上时邻近所述物体的第一表面并且与所述物体的所述第一表面分离的电极（23a，23b） 物体被布置在物体支撑件上，电极与物体支撑体的与物体的第一表面相邻的表面电连通; 以及电源（24a，24b），被布置成在所述电极和所述物体之间施加电压; 从而在物体和电极之间产生放电。

公开(公告)号：EP3129833A1

公开(公告)日：2017-02-15

申请号：EP15709638.9

申请日：2015-03-02

Applicant: ASML Netherlands B.V.

Inventor： VAN DER WILK, Ronald ,  GOORHUIS, Ger-Wim Jan

IPC: G03F7/20

CPC classification number: G03F7/70925 ,  H01L21/67028

Abstract: An apparatus for cleaning an object, the apparatus including: an object support for supporting the object; a low pressure chamber for exposing a first surface of the object to a low pressure when the object is arranged on the object support, an electrode arranged adjacent to and separated from the first surface of the object when the object is arranged on the object support, the electrode being in electrical communication with a surface of the object support which is adjacent the first surface of the object; and a power supply arranged to apply a voltage between the electrode and the object; thereby generating a discharge between the object and the electrode.

Abstract translation: 一种用于清洁物体（W）的装置，所述装置包括：用于支撑物体的物体支撑件（16）; 当所述物体被布置在所述物体支撑件上时，用于将所述物体的第一表面暴露于低压的低压室（15），当所述物体布置在所述物体上时邻近所述物体的所述第一表面并与所述物体的所述第一表面分离的电极（23a，23b） 物体布置在物体支撑件上，电极与物体支撑体的与物体的第一表面相邻的表面电连通; 以及电源（24a，24b），其布置成在所述电极和所述物体之间施加电压; 从而在物体和电极之间产生放电。

公开(公告)号：EP3129833B1

公开(公告)日：2018-05-02

申请号：EP15709638.9

申请日：2015-03-02

Applicant: ASML Netherlands B.V.

Inventor： VAN DER WILK, Ronald ,  GOORHUIS, Ger-Wim Jan

IPC: G03F7/20

CPC classification number: G03F7/70925 ,  H01L21/67028

Abstract: An apparatus for cleaning an object, the apparatus including: an object support for supporting the object; a low pressure chamber for exposing a first surface of the object to a low pressure when the object is arranged on the object support, an electrode arranged adjacent to and separated from the first surface of the object when the object is arranged on the object support, the electrode being in electrical communication with a surface of the object support which is adjacent the first surface of the object; and a power supply arranged to apply a voltage between the electrode and the object; thereby generating a discharge between the object and the electrode.