公开(公告)号：WO2014154428A2

公开(公告)日：2014-10-02

申请号：PCT/EP2014/053700

申请日：2014-02-26

Applicant: ASML NETHERLANDS B.V.

Inventor： LAFARRE, Raymond ,  ACHANTA, Satish ,  FILIPPI, Matteo ,  KARADE, Yogesh ,  NELLISSEN, Antonius ,  VAN DER WILK, Ronald ,  VAN DOREMALEN, Hendrikus, Christoffel, Maria ,  WELTERS, Wilhelmus

IPC: G03F7/20

CPC classification number: G03F7/70716 ,  G03F7/70708

Abstract: A method of manufacturing an object holder for use in a lithographic apparatus, the object holder comprising one or more electrically functional components, the method comprising: using a composite structure comprising a carrier sheet different from a main body of the object holder and a layered structure comprising one or a plurality of layers and formed on the carrier sheet; connecting the composite structure to a surface of the main body such that the layered structure is between the carrier sheet and the surface of the main body; and removing the carrier sheet from the composite structure, leaving the layered structure connected to the main body.

Abstract translation: 一种制造用于光刻设备的物体保持器的方法，所述物体保持器包括一个或多个电功能部件，所述方法包括：使用包括与所述物体保持器的主体不同的载体片的复合结构和层状结构 包括一个或多个层并形成在载体片上; 将复合结构连接到主体的表面，使得层状结构位于载体片和主体的表面之间; 并从复合结构中移除载体片，使分层结构连接到主体。

公开(公告)号：WO2015154917A1

公开(公告)日：2015-10-15

申请号：PCT/EP2015/054277

申请日：2015-03-02

Applicant: ASML NETHERLANDS B.V.

Inventor： VAN DER WILK, Ronald ,  GOORHUIS, Ger-Wim Jan

IPC: G03F7/20

CPC classification number: G03F7/70925 ,  H01L21/67028

Abstract: An apparatus for cleaning an object (W), the apparatus comprising: an object support (16) for supporting the object; a low pressure chamber (15) for exposing a first surface of the object to a low pressure when the object is arranged on the object support, an electrode (23a, 23b) arranged adjacent to and separated from the first surface of the object when the object is arranged on the object support, the electrode being in electrical communication with a surface of the object support which is adjacent the first surface of the object; and a power supply (24a, 24b) arranged to apply a voltage between the electrode and the object; thereby generating a discharge between the object and the electrode.

Abstract translation: 一种用于清洁物体（W）的装置，所述装置包括：用于支撑物体的物体支撑件（16）; 当所述物体被布置在所述物体支撑件上时，用于将所述物体的第一表面暴露于低压的低压室（15），当所述物体被布置在所述物体上时邻近所述物体的第一表面并且与所述物体的所述第一表面分离的电极（23a，23b） 物体被布置在物体支撑件上，电极与物体支撑体的与物体的第一表面相邻的表面电连通; 以及电源（24a，24b），被布置成在所述电极和所述物体之间施加电压; 从而在物体和电极之间产生放电。

公开(公告)号：WO2013050243A1

公开(公告)日：2013-04-11

申请号：PCT/EP2012/068386

申请日：2012-09-19

Applicant: ASML NETHERLANDS B.V.

Inventor： GILISSEN, Noud ,  LOOPSTRA, Erik ,  SIJBEN, Anko ,  CORNELISSEN, Bas ,  VAN SCHOOT, Jan ,  NOTENBOOM, Arnoud ,  VAN DER WILK, Ronald

IPC: G03F7/20

CPC classification number: G03F7/70708 ,  G03F7/707 ,  G03F7/70875 ,  G03F7/70908 ,  G10L15/08 ,  G10L2015/223 ,  H01L21/6831

Abstract: A chuck, chuck control system, lithographic apparatus and method of using a chuck are disclosed. In an embodiment, there is provided a chuck (43) for use in holding a patterning device (MA) or a substrate (W) onto a supporting table (MT, WT) of a lithography apparatus (100) by electrostatic force, in which the patterning device is for imparting a radiation beam (B) with a pattern in its cross-section to form a patterned radiation beam, and the substrate is for receiving the patterned radiation beam; said chuck comprising: a dielectric member (45); a temperature conditioning fluid channel (48) formed within the chuck; a drive electrode (40, 42) for applying a potential difference between the drive electrode and the patterning device or substrate across the dielectric member in order to electrostatically attract the patterning device or substrate towards the drive electrode; and a first shield electrode (60) for reducing or preventing the development of an electric field across temperature conditioning fluid in the temperature conditioning fluid channel due to a voltage applied to the drive electrode, in order to reduce or prevent electrolysis in the fluid.

Abstract translation: 公开了一种卡盘，卡盘控制系统，光刻设备和使用卡盘的方法。 在一个实施例中，提供了一种用于通过静电力将图案形成装置（MA）或基板（W）保持在光刻设备（100）的支撑台（MT，WT）上的卡盘，其中 图案形成装置用于在其横截面中赋予具有图案的辐射束（B）以形成图案化的辐射束，并且该衬底用于接收图案化的辐射束; 所述卡盘包括：电介质构件（45）; 形成在卡盘内的温度调节流体通道（48） 用于在驱动电极和图案形成装置或基板之间跨越电介质构件施加电位差的驱动电极（40,42），以便静电地将图案形成装置或衬底吸引到驱动电极; 以及第一屏蔽电极（60），用于减少或防止由于施加到驱动电极的电压而在温度调节流体通道中的温度调节流体的电场的发展，以便减少或防止流体中的电解。

公开(公告)号：WO2021037827A1

公开(公告)日：2021-03-04

申请号：PCT/EP2020/073704

申请日：2020-08-25

Applicant: ASML NETHERLANDS B.V.

Inventor： WANG, Yixiang ,  LIU, Shibing ,  CAO, Shanhui ,  QIU, Kangsheng ,  DOU, Juying ,  LUO, Ying ,  LI, Yinglong ,  LI, Qiang ,  VAN DER WILK, Ronald ,  VAN DER TOORN, Jan-Gerard, Cornelis

IPC: H01J37/317 ,  H01J37/20 ,  H01L21/683

Abstract: Systems and methods for wafer grounding and wafer grounding location adjustment are disclosed. A first method may include receiving a first value of an electric characteristic associated with the wafer being grounded by an electric signal; determining a first control parameter using at least the first value; and controlling a characteristic of the electric signal using the first control parameter and the first value. A second method for adjusting a grounding location for a wafer may include terminating an electric connection between the wafer and at least one grounding pin in contact the wafer; adjusting a relative position between the wafer and the grounding pin; and restoring the electric connection between the grounding pin and the wafer. A third method may include causing a grounding pin to penetrate through a coating on the wafer by impact; and establishing an electrical connection between the grounding pin and the wafer.

公开(公告)号：WO2015120923A1

公开(公告)日：2015-08-20

申请号：PCT/EP2014/073641

申请日：2014-11-04

Applicant: ASML NETHERLANDS B.V.

Inventor： VAN DER WILK, Ronald

IPC: G03F7/20

CPC classification number: G03F7/70708 ,  H01L21/6833

Abstract: A method of clamping articles (MA, W) for a lithographic apparatus, the method comprising: providing a chuck (50) comprising an electrode (40) connected to a power supply; providing an article on the chuck; applying with the power supply to the electrode a voltage having a clamping polarity so as to provide a clamping force between the chuck and the article on the chuck; replacing the article on the chuck with a succeeding article on the chuck; and applying a voltage having the clamping polarity to the electrode so as to provide a clamping force between the clamp and the succeeding article on the chuck.

Abstract translation: 一种夹持用于光刻设备的物品（MA，W）的方法，所述方法包括：提供包括连接到电源的电极（40）的卡盘（50） 在卡盘上提供物品; 向电极施加具有夹紧极性的电压以便在卡盘和卡盘上的物品之间提供夹紧力的电源; 用卡盘上的后续物品取代卡盘上的物品; 以及向所述电极施加具有所述夹持极性的电压，以便在所述夹具与所述卡盘上的后续制品之间提供夹紧力。

公开(公告)号：WO2016087069A1

公开(公告)日：2016-06-09

申请号：PCT/EP2015/071600

申请日：2015-09-21

Applicant: ASML NETHERLANDS B.V.

Inventor： HAUPTMANN, Marc ,  DAVIES, Dylan,John,David ,  JANSSEN, Paul ,  TSUGAMA, Naoko ,  BRULS, Richard, Joseph ,  HOEKERD, Kornelis, Tijmen ,  JANSSEN, Edwin, Johannes, Maria ,  VAN DEN OEVER, Petrus, Johannes ,  VAN DER WILK, Ronald ,  VAN SCHIJNDEL, Antonius, Hubertus ,  VIEYRA SALAS, Jorge, Alberto

IPC: G03F7/20 ,  G03F1/84 ,  G01N21/95 ,  H01L21/66 ,  H01L21/67

CPC classification number: G03F7/70616 ,  G01N21/9501 ,  G01N27/61 ,  G01N2021/95676 ,  G03F1/84 ,  G03F7/70508 ,  G03F7/70783 ,  H01L22/12 ,  H01L22/20

Abstract: A diagnostic apparatus monitors a lithographic manufacturing system. First measurement data representing local deviations of some characteristic across a substrate is obtained using sensors (202) within a lithographic apparatus, and/or a separate metrology tool (240). Other inspections tools (244, 248) perform wafer backside inspection to produce second measurement data (302). High- resolution backside defect image is processed into a form in which it can be compared with lower resolution information from the first measurement data. Cross-correlation is performed (CORR) to identify which of the observed defects are correlated spatially with the deviations represented in the first measurement data. A correlation map (506) is used to identify potentially relevant clusters of defects in the more detailed original defect map (520). The responsible apparatus can be identified by pattern recognition (PREC) as part of automated root cause analysis, alternatively, reticle inspection data may be used as second measurement data (302).

Abstract translation: 诊断装置监视光刻制造系统。 使用光刻设备内的传感器（202）和/或单独的计量工具（240）获得表示跨越衬底的某些特性的局部偏差的第一测量数据。 其他检查工具（244,248）执行晶片背面检查以产生第二测量数据（302）。 将高分辨率背面缺陷图像处理成可与第一测量数据中的较低分辨率信息进行比较的形式。 执行互相关（CORR）以识别哪些观察到的缺陷在空间上与第一测量数据中表示的偏差相关联。 相关图（506）用于在更详细的原始缺陷图（520）中识别潜在相关的缺陷簇。 负责的设备可以通过模式识别（PREC）来识别，作为自动根本原因分析的一部分，或者，掩模版检查数据可以用作第二测量数据（302）。

公开(公告)号：WO2021110336A1

公开(公告)日：2021-06-10

申请号：PCT/EP2020/080652

申请日：2020-11-02

Applicant: ASML NETHERLANDS B.V.

Inventor： VAN DER WILK, Ronald ,  GUAN, Tiannan

IPC: G03F7/20 ,  H01L21/683 ,  H01L21/67

Abstract: A clamp assembly is disclose, the clamp assembly comprising a clamp (50) configurable to clamp a support member (110) to a lower base surface (49) of the clamp by electrostatic adhesion, and an arrangement configurable to direct a gas to the lower base surface (49) of the clamp. The arrangement is configurable to humidify the gas by exposing the gas to a liquid. Also disclosed is a method of discharging a lower base surface of a clamp, The method comprises the steps of humidifying a gas by exposing the gas to a liquid, and directing the humidified gas to a lower base surface of the clamp.

公开(公告)号：WO2020114761A1

公开(公告)日：2020-06-11

申请号：PCT/EP2019/081710

申请日：2019-11-19

Applicant: ASML NETHERLANDS B.V.

Inventor： VAN DER WILK, Ronald

IPC: H01J37/248 ,  H01J5/34 ,  H01J5/46 ,  H01J19/60 ,  H01J9/32 ,  H01J23/14

Abstract: A feedthrough for providing an electrical connection is provided. The feedthrough comprises a conductor and a quartz or a glass structure configured to surround at least a portion of the conductor and provide isolation to the conductor. The conductor and the quartz or glass structure may be coaxially arranged. The feedthrough can provide an electrical connection between an inside and outside of a vacuum chamber that contains a sample.

公开(公告)号：WO2014122151A2

公开(公告)日：2014-08-14

申请号：PCT/EP2014/052204

申请日：2014-02-05

Applicant: ASML HOLDING N.V. ,  ASML NETHERLANDS B.V.

Inventor： DELPUERTO, Santiago, E ,  LIPSON, Matthew ,  HENDERSON, Kenneth ,  LAFARRE, Raymond ,  MARKOYA, Louis, John ,  UITTERDIJK, Tammo ,  VERMEULEN, Johannes, Petrus, Martinus, Bernardus ,  DE GROOT, Antonius, Franciscus, Johannes ,  VAN DER WILK, Ronald

IPC: G03F7/20

CPC classification number: G03F7/70875 ,  G03F7/70708 ,  H01L21/67109 ,  H01L21/6831 ,  H01L21/6875

Abstract: A support such as a clamp is configured to releasably hold a patterning device such as a reticle to secure it and prevent heat-induced deformation of it. For example, an electrostatic clamp includes a first substrate having opposing first and second surfaces, a plurality of burls located on the first surface and configured to contact the reticle, a second substrate having opposing first and second surfaces. The first surface of the second substrate is coupled to the second surface of the first substrate. A plurality of cooling elements is located between the first surface of the second substrate and the second surface of the first substrate. The cooling elements are configured to cause electrons to travel from the second surface of the first substrate to the first surface of the second substrate. Each cooling element is substantially aligned with a respective burl.

Abstract translation: 诸如夹具的支撑件被配置为可释放地保持诸如掩模版的图案形成装置以固定它并防止其热引起的变形。 例如，静电夹具包括具有相对的第一表面和第二表面的第一基底，位于第一表面上并被构造成接触掩模版的多个毛刺，具有相对的第一和第二表面的第二基底。 第二衬底的第一表面耦合到第一衬底的第二表面。 多个冷却元件位于第二基板的第一表面和第一基板的第二表面之间。 冷却元件构造成使电子从第一衬底的第二表面行进到第二衬底的第一表面。 每个冷却元件基本上与相应的毛刺对齐。

公开(公告)号：EP2764408B1

公开(公告)日：2019-08-21

申请号：EP12766409.2

申请日：2012-09-19

Applicant: ASML Netherlands B.V.

Inventor： GILISSEN, Noud ,  SIJBEN, Anko ,  CORNELISSEN, Bas ,  NOTENBOOM, Arnoud ,  VAN DER WILK, Ronald ,  SCHMITZ, Roger, Wilhelmus, Antonius, Henricus ,  WILL, Manon, Elise

IPC: G03F7/20