公开(公告)号：US09477160B2

公开(公告)日：2016-10-25

申请号：US14624167

申请日：2015-02-17

Applicant: ASML NETHERLANDS B.V.

Inventor： Bob Streefkerk ,  Johannes Jacobus Matheus Baselmans ,  Henrikus Herman Marie Cox ,  Antonius Theodorus Anna Maria Derksen ,  Sjoerd Nicolaas Lambertus Donders ,  Christiaan Alexander Hoogendam ,  Joeri Lof ,  Erik Roelof Loopstra ,  Jeroen Johannes Sophia Maria Mertens ,  Frits Van Der Meulen ,  Johannes Catharinus Hubertus Mulkens ,  Gerardus Petrus Matthijs Van Nunen ,  Klaus Simon ,  Bernardus Antonius Slaghekke ,  Alexander Straaijer ,  Jan-Gerard Cornelis Van Der Toorn ,  Martijn Houkes

IPC: G03B27/52 ,  G03B27/42 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/70425 ,  G03F7/70525 ,  G03F7/709

Abstract: In a lithographic apparatus, a localized area of the substrate surface under a projection system is immersed in liquid. The height of a liquid supply system above the surface of the substrate can be varied using actuators. A control system uses feedforward or feedback control with input of the surface height of the substrate to maintain the liquid supply system at a predetermined height above the surface of the substrate.

公开(公告)号：US10466595B2

公开(公告)日：2019-11-05

申请号：US15790287

申请日：2017-10-23

Applicant: ASML NETHERLANDS B.V.

Inventor： Bob Streefkerk ,  Johannes Jacobus Matheus Baselmans ,  Henrikus Herman Marie Cox ,  Antonius Theodorus Anna Maria Derksen ,  Sjoerd Nicolaas Lambertus Donders ,  Christiaan Alexander Hoogendam ,  Joeri Lof ,  Erik Roelof Loopstra ,  Jeroen Johannes Sophia Maria Mertens ,  Frits Van Der Meulen ,  Johannes Catharinus Hubertus Mulkens ,  Gerardus Petrus Matthijs Van Nunen ,  Klaus Simon ,  Bernardus Antonius Slaghekke ,  Alexander Straaijer ,  Jan-Gerard Cornelis Van Der Toorn ,  Martijn Houkes

IPC: G03F7/20

Abstract: In a lithographic apparatus, a localized area of the substrate surface under a projection system is immersed in liquid. The height of a liquid supply system above the surface of the substrate can be varied using actuators. A control system uses feedforward or feedback control with input of the surface height of the substrate to maintain the liquid supply system at a predetermined height above the surface of the substrate.

公开(公告)号：US09798246B2

公开(公告)日：2017-10-24

申请号：US15184770

申请日：2016-06-16

Applicant: ASML NETHERLANDS B.V.

Inventor： Bob Streefkerk ,  Johannes Jacobus Matheus Baselmans ,  Henrikus Herman Marie Cox ,  Antonius Theodorus Anna Maria Derksen ,  Sjoerd Nicolaas Lambertus Donders ,  Christiaan Alexander Hoogendam ,  Joeri Lof ,  Erik Roelof Loopstra ,  Jeroen Johannes Sophia Maria Mertens ,  Frits Van Der Meulen ,  Johannes Catharinus Hubertus Mulkens ,  Gerardus Petrus Matthijs Van Nunen ,  Klaus Simon ,  Bernardus Antonius Slaghekke ,  Alexander Straaijer ,  Jan-Gerard Cornelis Van Der Toorn ,  Martijn Houkes

IPC: G03B27/52 ,  G03B27/42 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/70425 ,  G03F7/70525 ,  G03F7/709

Abstract: In a lithographic apparatus, a localized area of the substrate surface under a projection system is immersed in liquid. The height of a liquid supply system above the surface of the substrate can be varied using actuators. A control system uses feedforward or feedback control with input of the surface height of the substrate to maintain the liquid supply system at a predetermined height above the surface of the substrate.