公开(公告)号：US20230418165A1

公开(公告)日：2023-12-28

申请号：US18252776

申请日：2021-10-22

Applicant: ASML NETHERLANDS B.V.

Inventor： Cornelius Maria ROPS ,  Erik, Henricus Egidius, Catharina EUMMELEN ,  Giovanni, Luca GATTOBIGIO ,  Christianus, Wilhelmus Johannes BERENDSEN

IPC: G03F7/00

CPC classification number: G03F7/70341

Abstract: Disclosed herein is a fluid handling system for a lithographic apparatus, wherein the fluid handling system is configured to confine immersion liquid to a liquid confinement space between a part of a projection system and a surface of a substrate in the lithographic apparatus whereby a radiation beam projected from the projection system can irradiate the surface of the substrate by passing through the immersion liquid, the fluid handling system comprising: a damper arranged between a first extraction member and a second extraction member both configured to extract fluid; wherein the damper is configured to support a meniscus of the immersion liquid between a surface of the damper and the surface of the substrate.