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公开(公告)号：US20180031982A1
公开(公告)日：2018-02-01
申请号：US15549132
申请日：2016-02-16
Applicant: ASML NETHERLANDS B.V.
Inventor： Han-Kwang NIENHUYS , Erik Willem BOGAART , Rilpho Ludovicus Donker , Borgert KRUIZINGA , Erik Roelof LOOPSTRA , Hako BOTMA , Gosse Charles DE VRIES , Olav Waldemar Vladimir FRIJNS , Johannes Jacobus Matheus BASELMANS
Abstract: A radiation alteration device includes a continuously undulating reflective surface, wherein the shape of the continuously undulating reflective surface follows a substantially periodic pattern.
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