-
公开(公告)号：US09823572B2
公开(公告)日：2017-11-21
申请号：US14900110
申请日：2014-06-17
Applicant: ASML Netherlands B.V.
Inventor： Andrey Alexandrovich Nikipelov , Olav Waldemar Vladimir Frijns , Gosse Charles De Vries , Erik Roelof Loopstra , Vadim Yevgenyevich Banine , Pieter Willem Herman De Jager , Rilpho Ludovicus Donker , Han-Kwang Nienhuys , Borgert Kruizinga , Wouter Joep Engelen , Otger Jan Luiten , Johannes Antonius Gerardus Akkermans , Leonardus Adrianus Gerardus Grimminck , Vladimir Litvinenko
IPC: G03B27/42 , G03B27/58 , G03F7/20 , H01S3/09 , G01J1/04 , G02B1/06 , G02B5/20 , G21K1/10 , G02B26/02 , G01J1/26 , G01J1/42 , H05H7/04 , H01S3/00
CPC classification number: G03F7/70033 , G01J1/0407 , G01J1/0418 , G01J1/26 , G01J1/429 , G02B1/06 , G02B5/205 , G02B26/023 , G03F7/70008 , G03F7/7055 , G03F7/70558 , G03F7/7085 , G21K1/10 , H01S3/005 , H01S3/0085 , H01S3/0903 , H05H7/04
Abstract: A method of patterning lithographic substrates that includes using a free electron laser to generate EUV radiation and delivering the EUV radiation to a lithographic apparatus which projects the EUV radiation onto lithographic substrates. The method further includes reducing fluctuations in the power of EUV radiation delivered to the lithographic substrates by using a feedback-based control loop to monitor the free electron laser and adjust operation of the free electron laser accordingly, and applying variable attenuation to EUV radiation that has been output by the free electron laser in order to further control the power of EUV radiation delivered to the lithographic apparatus.
-
公开(公告)号：US11984236B2
公开(公告)日：2024-05-14
申请号：US16743025
申请日：2020-01-15
Applicant: ASML NETHERLANDS B.V.
Inventor： Han-Kwang Nienhuys , Rilpho Ludovicus Donker , Gosse Charles De Vries
CPC classification number: G21K1/067 , G02B5/0221 , G02B5/0268 , G02B5/0284 , G03F7/7005 , G03F7/70075 , G03F7/70991 , G03F7/70191 , G21K2201/064 , H01S3/2308 , H05G2/008
Abstract: A radiation system includes a beam splitting apparatus configured to split a main radiation beam into a plurality of branch radiation beams and a radiation alteration device arranged to receive an input radiation beam and output a modified radiation beam, wherein the radiation alteration device is configured to provide an output modified radiation beam which has an increased etendue, when compared to the received input radiation beam, wherein the radiation alteration device is arranged such that the input radiation beam which is received by the radiation alteration device is a main radiation beam and the radiation alteration device is configured to provide a modified main radiation beam to the beam splitting apparatus, or wherein the radiation alteration device is arranged such that the input radiation beam which is received by the radiation alteration device is a branch radiation beam output from the beam splitting apparatus.
-
公开(公告)号：US12174550B2
公开(公告)日：2024-12-24
申请号：US17782268
申请日：2020-12-11
Applicant: ASML Netherlands B.V.
Inventor： Daniel Jason Riggs , Liane Manuela Matthes , Rilpho Ludovicus Donker , Martinus Hendrikus Antonius Leenders
Abstract: A metrology system includes a light beam metrology apparatus configured to sense one or more aspects of an amplified light beam and to make adjustments to the amplified light beam based on the sensed one or more aspects; a target metrology apparatus configured to measure one or more properties of a modified target after a target has interacted with the amplified light beam, and to determine a moment when the modified target achieves a reference calibration state; and a control apparatus configured to: receive the reference calibration state and the moment at which the reference calibration state is achieved from the target metrology apparatus; determine a light beam calibration state of the amplified light beam based on the received reference calibration state and the moment at which the reference calibration state is achieved; and provide the light beam calibration state to the light beam metrology apparatus.
-
公开(公告)号：US20230018949A1
公开(公告)日：2023-01-19
申请号：US17782268
申请日：2020-12-11
Applicant: ASML Netherlands B.V.
Inventor： Daniel Jason Riggs , Liane Manuela Matthes , Rilpho Ludovicus Donker , Martinus Hendrikus Antonius Leenders
Abstract: A metrology system includes a light beam metrology apparatus configured to sense one or more aspects of an amplified light beam and to make adjustments to the amplified light beam based on the sensed one or more aspects; a target metrology apparatus configured to measure one or more properties of a modified target after a target has interacted with the amplified light beam, and to determine a moment when the modified target achieves a reference calibration state; and a control apparatus configured to: receive the reference calibration state and the moment at which the reference calibration state is achieved from the target metrology apparatus; determine a light beam calibration state of the amplified light beam based on the received reference calibration state and the moment at which the reference calibration state is achieved; and provide the light beam calibration state to the light beam metrology apparatus.
-
公开(公告)号：US10580546B2
公开(公告)日：2020-03-03
申请号：US15549132
申请日：2016-02-16
Applicant: ASML NETHERLANDS B.V.
Inventor： Han-Kwang Nienhuys , Rilpho Ludovicus Donker , Gosse Charles De Vries
Abstract: A radiation alteration device includes a continuously undulating reflective surface, wherein the shape of the continuously undulating reflective surface follows a substantially periodic pattern.
-
Patent Agency Ranking
公开(公告)号：US20180031982A1
公开(公告)日：2018-02-01
申请号：US15549132
申请日：2016-02-16
Applicant: ASML NETHERLANDS B.V.
Inventor： Han-Kwang NIENHUYS , Erik Willem BOGAART , Rilpho Ludovicus Donker , Borgert KRUIZINGA , Erik Roelof LOOPSTRA , Hako BOTMA , Gosse Charles DE VRIES , Olav Waldemar Vladimir FRIJNS , Johannes Jacobus Matheus BASELMANS
Abstract: A radiation alteration device includes a continuously undulating reflective surface, wherein the shape of the continuously undulating reflective surface follows a substantially periodic pattern.
-
公开(公告)号：US20250085641A1
公开(公告)日：2025-03-13
申请号：US18960519
申请日：2024-11-26
Applicant: ASML Netherlands B.V.
Inventor： Daniel Jason Riggs , Liane Manuela Matthes , Rilpho Ludovicus Donker , Martinus Hendrikus Antonius Leenders
Abstract: A metrology system includes a light beam metrology apparatus configured to sense one or more aspects of an amplified light beam and to make adjustments to the amplified light beam based on the sensed one or more aspects; a target metrology apparatus configured to measure one or more properties of a modified target after a target has interacted with the amplified light beam, and to determine a moment when the modified target achieves a reference calibration state; and a control apparatus configured to: receive the reference calibration state and the moment at which the reference calibration state is achieved from the target metrology apparatus; determine a light beam calibration state of the amplified light beam based on the received reference calibration state and the moment at which the reference calibration state is achieved; and provide the light beam calibration state to the light beam metrology apparatus.
-
公开(公告)号：US11140765B2
公开(公告)日：2021-10-05
申请号：US16649025
申请日：2018-08-16
Applicant: ASML Netherlands B.V.
Inventor： Rilpho Ludovicus Donker , Han-Kwang Nienhuys
IPC: H05G2/00
Abstract: A radiation source comprises: an emitter for emitting a fuel target towards a plasma formation region; a laser system for hitting the target with a laser beam to generating a plasma; a collector for collecting radiation emitted by the plasma; an imaging system configured to capture an image of the target; one or more markers at the collector and within a field of view of the imaging system; and a controller. The controller receives data representative of the image; and controls operation of the radiation source in dependence on the data.
-
公开(公告)号：US20200152345A1
公开(公告)日：2020-05-14
申请号：US16743025
申请日：2020-01-15
Applicant: ASML NETHERLANDS B.V.
Inventor： Han-Kwang NIENHUYS , Rilpho Ludovicus Donker , Gosse Charles De Vries
Abstract: A radiation system includes a beam splitting apparatus configured to split a main radiation beam into a plurality of branch radiation beams and a radiation alteration device arranged to receive an input radiation beam and output a modified radiation beam, wherein the radiation alteration device is configured to provide an output modified radiation beam which has an increased etendue, when compared to the received input radiation beam, wherein the radiation alteration device is arranged such that the input radiation beam which is received by the radiation alteration device is a main radiation beam and the radiation alteration device is configured to provide a modified main radiation beam to the beam splitting apparatus, or wherein the radiation alteration device is arranged such that the input radiation beam which is received by the radiation alteration device is a branch radiation beam output from the beam splitting apparatus.
-
公开(公告)号：US10580545B2
公开(公告)日：2020-03-03
申请号：US14917623
申请日：2014-09-24
Applicant: ASML Netherlands B.V.
Inventor： Vadim Yevgenyevich Banine , Petrus Rutgerus Bartraij , Ramon Pascal Van Gorkom , Lucas Johannes Peter Ament , Pieter Willem Herman De Jager , Gosse Charles De Vries , Rilpho Ludovicus Donker , Wouter Joep Engelen , Olav Waldemar Vladimir Frijns , Leonardus Adrianus Gerardus Grimminck , Andelko Katalenic , Erik Roelof Loopstra , Han-Kwang Nienhuys , Andrey Alexandrovich Nikipelov , Michael Jozef Mathijs Renkens , Franciscus Johannes Joseph Janssen , Borgert Kruizinga
Abstract: A delivery system for use within a lithographic system. The beam delivery system comprises optical elements arranged to receive a radiation beam from a radiation source and to reflect portions of radiation along one or more directions to form a one or more branch radiation beams for provision to one or more tools.
-
-
-
-
-
-
-
-
-
Search Results
10
records
(took 0.056 seconds)
