公开(公告)号：US20150116675A1

公开(公告)日：2015-04-30

申请号：US14584826

申请日：2014-12-29

Applicant: ASML NETHERLANDS B.V.

Inventor： Hans JANSEN ,  Johannes Jacobus Matheus BASELMANS ,  Sjoerd Nicolaas Lambertus DONDERS ,  Christiaan Alexander HOOGENDAM ,  Jeroen Johannes Sophia Maria MERTENS ,  Johannes Catharinus Hubertus MULKENS ,  Marco Koert STAVENGA ,  Bob STREEFKERK ,  Jan Cornelis VAN DER HOEVEN ,  Cedric Desire GROUWSTRA

IPC: G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/70925

Abstract: A method and apparatus for cleaning the inside of an immersion lithographic apparatus is disclosed. In particular, a liquid supply system of the lithographic apparatus may be used to introduce a cleaning fluid into a space between the projection system and the substrate table of the lithographic apparatus. Additionally or alternatively, a cleaning device may be provided on the substrate table and an ultrasonic emitter may be provided to create an ultrasonic cleaning liquid.

Abstract translation: 公开了一种清洗浸没式光刻设备内部的方法和装置。 特别地，可以使用光刻设备的液体供应系统将清洁流体引入到投影系统和光刻设备的基板台之间的空间中。 另外或替代地，可以在衬底台上设置清洁装置，并且可以设置超声发射器以产生超声波清洗液体。

公开(公告)号：US20150286152A1

公开(公告)日：2015-10-08

申请号：US14746605

申请日：2015-06-22

Applicant: ASML Netherlands B.V.

Inventor： Jan Cornelis VAN DER HOEVEN

IPC: G03F7/20

CPC classification number: G03F7/70341 ,  G03F1/82 ,  G03F7/70916 ,  G03F7/70925

Abstract: A method for preventing or reducing contamination of an immersion type projection apparatus is provided. The apparatus includes at least one immersion space that is at least partially filled with a liquid when the apparatus projects a beam of radiation onto a substrate. The method includes rinsing at least part of the immersion space with a rinsing liquid before the apparatus is used to project the beam of radiation onto a substrate.

Abstract translation: 提供一种防止或减少浸没式投影装置的污染的方法。 当设备将辐射束投射到基底上时，该装置包括至少一个浸没空间，至少部分地填充有液体。 该方法包括在使用该装置将辐射束投射到基底之前用冲洗液冲洗至少部分浸没空间。

公开(公告)号：US20180364585A1

公开(公告)日：2018-12-20

申请号：US16111313

申请日：2018-08-24

Applicant: ASML Netherlands B.V.

Inventor： Jan Cornelis VAN DER HOEVEN

IPC: G03F7/20 ,  G03F1/82

Abstract: A method for preventing or reducing contamination of an immersion type projection apparatus is provided. The apparatus includes at least one immersion space that is at least partially filled with a liquid when the apparatus projects a beam of radiation onto a substrate. The method includes rinsing at least part of the immersion space with a rinsing liquid before the apparatus is used to project the beam of radiation onto a substrate.