公开(公告)号：US20240369943A1

公开(公告)日：2024-11-07

申请号：US18576441

申请日：2022-06-21

Applicant: ASML NETHERLANDS B.V.

Inventor： Kedir Mohammed ADAL ,  Reza SAHRAEIAN ,  Leon Paul VAN DIJK ,  Richard Johannes, Franciscus VAN HAREN ,  Abu, Niyam Md, Mushfiqul HAQUE

IPC: G03F7/00

Abstract: Methods, systems, and apparatus for mapping high dimensional data related to a lithographic apparatus, etch tool, metrology tool or inspection tool to a lower dimensional representation of the data. High dimensional data is obtained related to the apparatus. The high dimensional data has first dimensions N greater than two. A nonlinear parametric model is obtained, which has been trained to map a training set of high dimensional data onto a lower dimensional representation. The lower dimensional representation has second dimensions M, wherein Mis less than N. The model has been trained using a cost function configured to make the mapping preserve local similarities in the training set of high dimensional data. Using the model, the obtained high dimensional data is mapped to the corresponding lower dimensional representation.