公开(公告)号：WO2020048693A1

公开(公告)日：2020-03-12

申请号：PCT/EP2019/070748

申请日：2019-08-01

Applicant: ASML NETHERLANDS B.V.

Inventor： SLOTBOOM, Daan, Maurits ,  HEIJMERIKX, Hermannes, Theodorus ,  LOAIZA RIVAS, Javier ,  COTTAAR, Jeroen

IPC: G03F7/20

Abstract: According to an aspect of the invention there is provided a method of configuring a step of scanning a beam of photons or particles across a patterning device for exposing a pattern onto a substrate, wherein the method comprises determining a spatial resolution of a patterning correction configured to improve quality of the exposing, and determining a spatial dimension of the beam based on the determined spatial resolution of the patterning correction.