公开(公告)号：WO2014095262A1

公开(公告)日：2014-06-26

申请号：PCT/EP2013/074713

申请日：2013-11-26

Applicant: ASML NETHERLANDS B.V.

Inventor： BANINE, Vadim ,  BENSCHOP, Jozef ,  MOORS, Johannes

IPC: G03F7/20 ,  H05G2/00

CPC classification number: G03F7/70033 ,  G03F7/70916 ,  H05G2/008

Abstract: An EUV radiation source comprises a laser beam delivery system for delivering a beam to a target position. EUV radiation is emitted by a plasma at a position and is collected by a grazing incidence collector and focused to a desired position. A debris trap (140') is provided to prevent contamination from the plasma reaching the collector and other optical surfaces. The laser beam delivery system is designed to provide said laser radiation with a modified intensity distribution comprising substantially all the energy of the incoming radiation, but having regions (202, 204) of low intensity corresponding to the locations of parts (142, 144') of the debris trap. In an example with a rotating foil trap, a rotating, segmented intensity distribution is generated using facetted axicon elements. A central low intensity region allows bearing, drive and cooling apparatus to be mounted at the hub of the debris trap.

Abstract translation: EUV辐射源包括用于将光束传送到目标位置的激光束传送系统。 EUV辐射由等离子​​体在一个位置发射，并由掠入射收集器收集并聚焦到期望的位置。 提供碎屑捕集器（140'）以防止等离子体到达集电器和其它光学表面的污染。 激光束传送系统被设计成向所述激光辐射提供修改的强度分布，其包括进入辐射的基本上所有能量，但是具有对应于部分（142,144'）的位置的低强度的区域（202,204） 的碎片陷阱。 在具有旋转箔捕获器的示例中，使用分面旋转元件产生旋转的分段强度分布。 中心低强度区域允许轴承，驱动和冷却装置安装在碎屑捕集器的轮毂处。