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    GRAZING INCIDENCE REFLECTOR, LITHOGRAPHIC APPARATUS, METHOD FOR MANUFACTURING GRAZING INCIDENCE REFLECTOR AND METHOD FOR MANUFACTURING A DEVICE
    2.
    发明申请
    GRAZING INCIDENCE REFLECTOR, LITHOGRAPHIC APPARATUS, METHOD FOR MANUFACTURING GRAZING INCIDENCE REFLECTOR AND METHOD FOR MANUFACTURING A DEVICE 审中-公开
    烧结引发反射器，光刻设备，制造激光发射反射器的方法和制造器件的方法

    公开(公告)号：WO2012113591A1

    公开(公告)日：2012-08-30

    申请号：PCT/EP2012/050676

    申请日：2012-01-18

    Applicant: ASML NETHERLANDS B.V. ,  YAKUNIN, Andrei ,  BANINE, Vadim ,  FRIJNS, Olav

    Inventor： YAKUNIN, Andrei ,  BANINE, Vadim ,  FRIJNS, Olav

    IPC: G03F7/20 ,  G21K1/06 ,  G02B5/08

    CPC classification number: G03F7/702 ,  B82Y10/00 ,  G02B5/0891 ,  G03F7/70058 ,  G21K1/062 ,  G21K2201/061

    Abstract: A grazing incidence reflector (300) for EUV radiation includes a first mirror layer (310) and a multilayer mirror structure (320) beneath the first mirror layer. The first mirror layer reflects at least partially EUV radiation incident on the reflector with grazing incidence angles in a first range, and the first mirror layer transmits EUV radiation in a second range of incidence angles, which overlaps and extends beyond the first range of incidence angles. The multilayer mirror structure reflects EUV radiation that is incident on the reflector with grazing incidence angles in a second range that penetrates through the first mirror layer. A grazing incidence reflector can be used in a lithographic apparatus and in manufacturing a device by a lithographic process.

    Abstract translation: 用于EUV辐射的掠入射反射器（300）包括第一镜层下面的第一镜层（310）和多层反射镜结构（320）。 第一镜层反射入射在反射器上的至少一部分EUV辐射，其具有在第一范围内的掠入射角，并且第一镜层在与入射角的第一范围重叠并延伸超过入射角的第二范围内传输EUV辐射 。 多层反射镜结构反射入射在反射器上的EUV辐射，其中掠射入射角在穿过第一镜层的第二范围内。 掠入射反射器可以用在光刻设备中并且通过光刻工艺制造器件。

    SPECTRAL PURITY FILTER, LITHOGRAPHIC APPARATUS, AND METHOD FOR MANUFACTURING A SPECTRAL PURITY FILTER
    5.
    发明申请
    SPECTRAL PURITY FILTER, LITHOGRAPHIC APPARATUS, AND METHOD FOR MANUFACTURING A SPECTRAL PURITY FILTER 审中-公开
    光谱滤光片，光刻设备和制造光谱滤光片的方法

    公开(公告)号：WO2011000622A1

    公开(公告)日：2011-01-06

    申请号：PCT/EP2010/056436

    申请日：2010-05-11

    Applicant: ASML Netherlands B.V. ,  YAKUNIN, Andrei ,  BANINE, Vadim ,  GLUSHKOV, Denis

    Inventor： YAKUNIN, Andrei ,  BANINE, Vadim ,  GLUSHKOV, Denis

    IPC: G03F7/20 ,  G21K1/06 ,  H05G2/00

    CPC classification number: G03F7/70925 ,  G03F7/70033 ,  G03F7/70166 ,  G03F7/70191 ,  G03F7/70575 ,  G03F7/70983 ,  G21K1/06 ,  G21K1/10 ,  G21K2201/067

    Abstract: A transmissive spectral purity filter configured to transmit extreme ultraviolet radiation includes a filter part having a plurality of apertures to transmit extreme ultraviolet radiation and to suppress transmission of a second type of radiation. The apertures may be manufactured in semiconductor material such as silicon by an anisotropic etching process. The semiconductor material is provided with a hydrogen-resistant layer, such as silicon nitride Si 3 N 4 , silicon dioxide SiO 2 , or silicon carbide SiC. Roughness features may be exaggerated in the sidewalls of the apertures. The filter part may be less than about 20 μm thick with apertures about 2 μm to about 4 μm in width.

    Abstract translation: 配置为透射极紫外线辐射的透射光谱纯度滤光器包括具有多个孔以过滤极紫外辐射并抑制第二类辐射的透射的滤光器部分。 可以通过各向异性蚀刻工艺在诸如硅的半导体材料中制造孔。 半导体材料设置有耐氮层，例如氮化硅Si 3 N 4，二氧化硅SiO 2或碳化硅SiC。 粗糙度特征可能在孔的侧壁中被夸大。 过滤器部分可以小于约20μm厚，孔宽度大约2μm至大约4μm。

    FREE ELECTRON LASER
    6.
    发明申请
    FREE ELECTRON LASER 审中-公开
    免费电子激光

    公开(公告)号：WO2015067467A1

    公开(公告)日：2015-05-14

    申请号：PCT/EP2014/072588

    申请日：2014-10-22

    Applicant: ASML NETHERLANDS B.V.

    Inventor： AKKERMANS, Johannes, ,  AMENT, Lucas ,  BANINE, Vadim ,  COENEN, Teis, Johan ,  DE JAGER, Pieter ,  DE VRIES, Gosse ,  FRIJNS, Olav ,  GRIMMINCK, Leonardus ,  KATALENIC, Andelko ,  LOOPSTRA, Erik ,  LUITEN, Otger ,  NIKIPELOV, Andrey

    IPC: H01S3/09 ,  H05H9/00 ,  H01J25/12 ,  H01J23/027 ,  H05H7/12

    CPC classification number: H01S3/0903 ,  G03F7/70208 ,  H01J23/027 ,  H01J25/10 ,  H05H9/00

    Abstract: A free electron laser comprising: an electron source (21), a linear accelerator (22), an undulator (26), electron beam optics and a deceleration unit (28'). The electron source is operable to produce a bunched electron beam. The linear accelerator arranged to impart energy to electrons in the bunched electron beam produced by the electron source. The undulator is operable to produce a periodic magnetic field and is arranged so as to guide the bunched electron beam along a periodic path about a central axis of the undulator such that they interact with radiation in the undulator, stimulating emission of coherent radiation. The electron beam optics is arranged to direct the bunched electron beam back into the linear accelerator after it leaves the undulator so as to extract energy from electrons in the bunched electron beam. The deceleration unit is arranged to extract energy from electrons in the bunched electron beam after it has left the undulator. The deceleration unit comprises one or more resonant cavities (33), and an energy dissipation mechanism. The bunched electron beam is directed through the one or more resonant cavities so as to excite one or more resonant standing wave modes therein.

    Abstract translation: 一种自由电子激光器，包括：电子源（21），线性加速器（22），波动器（26），电子束光学器件和减速单元（28'）。 电子源可操作以产生聚束电子束。 线性加速器被布置成赋予由电子源产生的聚束电子束中的电子能量。 波动器可操作以产生周期性磁场，并且被布置成引导聚束电子束沿着围绕波动器的中心轴线的周期性路径，使得它们与波动器中的辐射相互作用，刺激相干辐射的发射。 电子束光学器件被布置成在聚束束电子束离开波束器之后将聚束电子束引导回线性加速器，以便从束电子束中的电子提取能量。 减速单元被布置成在束状电子束离开波动器之后从电子束中的电子提取能量。 减速单元包括一个或多个谐振腔（33）和能量耗散机构。 聚束电子束被引导通过一个或多个谐振腔，以激发其中的一个或多个共振驻波模式。

    BEAM DELIVERY FOR EUV LITHOGRAPHY
    7.
    发明申请
    BEAM DELIVERY FOR EUV LITHOGRAPHY 审中-公开
    BEV交付用于EUV LITHOGRAPHY

    公开(公告)号：WO2014095262A1

    公开(公告)日：2014-06-26

    申请号：PCT/EP2013/074713

    申请日：2013-11-26

    Applicant: ASML NETHERLANDS B.V.

    Inventor： BANINE, Vadim ,  BENSCHOP, Jozef ,  MOORS, Johannes

    IPC: G03F7/20 ,  H05G2/00

    CPC classification number: G03F7/70033 ,  G03F7/70916 ,  H05G2/008

    Abstract: An EUV radiation source comprises a laser beam delivery system for delivering a beam to a target position. EUV radiation is emitted by a plasma at a position and is collected by a grazing incidence collector and focused to a desired position. A debris trap (140') is provided to prevent contamination from the plasma reaching the collector and other optical surfaces. The laser beam delivery system is designed to provide said laser radiation with a modified intensity distribution comprising substantially all the energy of the incoming radiation, but having regions (202, 204) of low intensity corresponding to the locations of parts (142, 144') of the debris trap. In an example with a rotating foil trap, a rotating, segmented intensity distribution is generated using facetted axicon elements. A central low intensity region allows bearing, drive and cooling apparatus to be mounted at the hub of the debris trap.

    Abstract translation: EUV辐射源包括用于将光束传送到目标位置的激光束传送系统。 EUV辐射由等离子​​体在一个位置发射，并由掠入射收集器收集并聚焦到期望的位置。 提供碎屑捕集器（140'）以防止等离子体到达集电器和其它光学表面的污染。 激光束传送系统被设计成向所述激光辐射提供修改的强度分布，其包括进入辐射的基本上所有能量，但是具有对应于部分（142,144'）的位置的低强度的区域（202,204） 的碎片陷阱。 在具有旋转箔捕获器的示例中，使用分面旋转元件产生旋转的分段强度分布。 中心低强度区域允许轴承，驱动和冷却装置安装在碎屑捕集器的轮毂处。

    LITHOGRAPHIC APPARATUS
    8.
    发明申请
    LITHOGRAPHIC APPARATUS 审中-公开
    光刻设备

    公开(公告)号：WO2014063878A2

    公开(公告)日：2014-05-01

    申请号：PCT/EP2013/069713

    申请日：2013-09-23

    Applicant: ASML NETHERLANDS B.V.

    Inventor： NIKIPELOV, Andrey ,  BANINE, Vadim ,  YAKUNIN, Andrei

    IPC: G03F7/20

    CPC classification number: G03F7/70033 ,  G02B17/0657 ,  G02B17/0808 ,  G03F7/70041 ,  G03F7/7005 ,  H05G2/006 ,  H05G2/008

    Abstract: A radiation source for a lithographic apparatus uses a plurality of fiber lasers to ignite a fuel droplet at an ignition location to generate EUV radiation. The fiber lasers may be provided to emit parallel to an optical axis and a telescopic optical system is provided to focus the lasers at the ignition location, or the lasers may be directed towards the optical axis with a final focus lens being used to reduce beam waist. The lasers may be provided in two or more groups to allow them to be independently controlled and some of the lasers may be focused at a different location to provide a pre-pulse. Radiation from fiber lasers may also be combined using dichroic mirrors.

    Abstract translation: 用于光刻设备的辐射源使用多个光纤激光器在点火位置点燃燃料液滴以产生EUV辐射。 光纤激光器可以被设置为与光轴平行地发射，并且提供了望远镜光学系统以将激光聚焦在点火位置，或者激光器可以被引导朝向光轴，并且最终的聚焦透镜被用于减小束腰 。 激光器可以提供两个或更多个组以允许它们被独立控制，并且一些激光器可以被聚焦在不同的位置以提供预脉冲。 光纤激光器的辐射也可以使用分色镜进行组合。

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