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公开(公告)号：WO2020058388A1
公开(公告)日：2020-03-26
申请号：PCT/EP2019/075143
申请日：2019-09-19
Applicant: ASML NETHERLANDS B.V.
Inventor： DEN BOEF, Arie, Jeffrey , BHATTACHARYYA, Kaustuve , MORISAKI, Kenji , MATHIJSSEN, Simon, Gijsbert, Josephus
IPC: G03F7/20
Abstract: A method to measure a parameter of a manufacturing process comprising illuminating a target with radiation detecting the scattered radiation from the target determining the parameter of interest from an asymmetry of the detected radiation.
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