公开(公告)号：US11086239B2

公开(公告)日：2021-08-10

申请号：US16981813

申请日：2019-03-13

Applicant: ASML NETHERLANDS B.V.

Inventor： Miao Yu ,  Petrus Martinus Gerardus Johannes Arts ,  Erik Henricus Egidius Catharina Eummelen ,  Giovanni Luca Gattobigio ,  Maarten Holtrust ,  Han Henricus Aldegonda Lempens ,  Ferdy Migchelbrink ,  Theodorus Wilhelmus Polet ,  Gheorghe Tanasa

IPC: G03F7/20

Abstract: A cleaning device for an apparatus for processing production substrates, the cleaning device including: a body having dimensions similar to the production substrates so that the cleaning device is compatible with the apparatus, the body having a first major surface and a second major surface facing in the opposite direction to the first major surface; a chamber within the body configured to accommodate contaminants; an inlet from the first major surface to the chamber and configured to allow contaminants to be drawn into the chamber by a flow of fluid; and an outlet from the chamber to the second major surface, the cleaning device being configured to allow the fluid to exit the chamber but to prevent a contaminant leaving the chamber.

公开(公告)号：US11762304B2

公开(公告)日：2023-09-19

申请号：US15570934

申请日：2016-03-29

Applicant: ASML Netherlands B.V.

Inventor： Güneş Nak{dot over (i)}boğlu ,  Maarten Holtrust ,  Martinus Van Duijnhoven ,  Francis Fahrni ,  Frank Johannes Jacobus Van Boxtel ,  Anne Willemijn Bertine Quist ,  Bart Dinand Paarhuis ,  Daan Daniel Johannes Antonius Van Sommeren

IPC: G03F7/20 ,  G03F7/00

CPC classification number: G03F7/70858 ,  G03F7/709 ,  G03F7/70308 ,  G03F7/70883 ,  G03F7/70891

Abstract: A lithographic apparatus has: a conduit through which a gas can flow; a gas mover configured to cause the gas to flow in the conduit; a wall in contact with the gas in the conduit and defining a membrane aperture therein; and an acoustic filter including a flexible membrane fixed in the membrane aperture. The acoustic filter reduces transmission of acoustic disturbances without adding any flow resistance.