公开(公告)号：US20240346200A1

公开(公告)日：2024-10-17

申请号：US18683124

申请日：2022-08-04

Applicant: ASML NETHERLANDS B.V.

Inventor： Vahid BASTANI ,  Yichen ZHANG ,  Marsil DE ATHAYDE COSTA E SILVA ,  Hermanus Adrianus DILLEN ,  Robert Jan VAN WIJK

IPC: G06F30/17 ,  G06F30/27

CPC classification number: G06F30/17 ,  G06F30/27

Abstract: A computer implemented method of determining a placement metric relating to placement of one or more features on a substrate in a lithographic process. The method includes obtaining setup data including placement error contributor data relating to a plurality of placement error contributor parameters and yield data representative of yield and defining a statistical model for predicting a yield metric, the statistical model being based on a placement metric, the placement metric being a function of the placement error contributor parameters, and associated model coefficients. The model coefficients are fitted based on the setup data, and the placement metric determined from the fitted model coefficients.