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公开(公告)号:US20190243259A1
公开(公告)日:2019-08-08
申请号:US16318388
申请日:2017-06-22
Applicant: ASML NETHERLANDS B.V.
Inventor: Wim Tjibbo TEL , Frank STAALS , Martin Jules Marie-Emile DE NIVELLE , Tanbir HASAN
IPC: G03F9/00 , G05B19/4097
CPC classification number: G03F9/7034 , G05B19/4097 , G05B2219/45028 , G05B2219/45031
Abstract: A method of determining topographical variation across a substrate on which one or more patterns have been applied. The method includes obtaining measured topography data representing a topographical variation across a substrate on which one or more patterns have been applied by a lithographic process; and combining the measured topography data with knowledge relating to intra-die topology to obtain derived topography data having a resolution greater than the resolution of the measured topography data. Also disclosed is a corresponding level sensor apparatus and lithographic apparatus having such a level sensor apparatus, and a more general method of determining variation of a physical parameter from first measurement data of variation of the physical parameter across the substrate and intra-die measurement data of higher resolution than the first measurement data and combining these.
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公开(公告)号:US20220244651A1
公开(公告)日:2022-08-04
申请号:US17625466
申请日:2020-06-15
Applicant: ASML Netherlands B.V.
Inventor: Andrey Valerievich ROGACHEVSKIY , Martin Jules Marie-Emile DE NIVELLE , Arjan GIJSBERTSEN , Willem Richard PONGERS , Viktor TROGRLIC
Abstract: An apparatus for measuring a height of a substrate for processing in a lithographic apparatus is disclosed. The apparatus comprises a first sensor for sensing a height of the substrate over a first area. The apparatus also comprises a second sensor for sensing a height of the substrate over a second area. The apparatus further comprises a processor adapted to normalize first data corresponding to a signal from the first sensor with a second sensor footprint to produce a first normalized height data, and to normalize second data corresponding to a signal from the second sensor with a first sensor footprint to produce a second normalized height data. The processor is adapted to determine a correction to a measured height of the substrate based on a difference between the first and second normalized height data.
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