公开(公告)号：US10884342B2

公开(公告)日：2021-01-05

申请号：US15771585

申请日：2016-10-07

Applicant: ASML NETHERLANDS B.V.

Inventor： Martinus Gerardus Maria Johannes Maassen ,  Reinder Teun Plug ,  Kaustuve Bhattacharyya

IPC: G03F7/20 ,  G06F30/39 ,  G06F119/18

Abstract: A metrology system can be integrated within a lithographic apparatus to provide integrated metrology within the lithographic process. However, this integration can result in a throughput or productivity impact of the whole lithographic apparatus which can be difficult to predict. It is therefore proposed to acquire throughput information associated with a throughput of a plurality of substrates within a lithographic apparatus, the throughput information including a throughput parameter, and predict, using a throughput simulator, a throughput using the throughput parameter as an input parameter. The throughput simulator may be calibrated using the acquired throughput information. The impact of at least one change of a throughput parameter on the throughput of the lithographic apparatus may be predicted using the throughput simulator.

公开(公告)号：US12165837B2

公开(公告)日：2024-12-10

申请号：US17901767

申请日：2022-09-01

Applicant: ASML Netherlands B.V.

Inventor： Martinus Gerardus Maria Johannes Maassen ,  Joost Jeroen Ottens ,  Long Ma ,  Youfei Jiang ,  Weihua Yin ,  Wei-Te Li ,  Xuedong Liu

IPC: H01J37/26 ,  H01J37/147 ,  H01J37/22 ,  H01J37/28

Abstract: An improved system and method for inspection of a sample using a particle beam inspection apparatus, and more particularly, to systems and methods of scanning a sample with a plurality of charged particle beams. An improved method of scanning an area of a sample using N charged particle beams, wherein N is an integer greater than or equal to two, and wherein the area of the sample comprises a plurality of scan sections of N consecutive scan lines, includes moving the sample in a first direction. The method also includes scanning, with a first charged particle beam of the N charged particle beams, first scan lines of at least some scan sections of the plurality of scan sections moving towards a probe spot of the first charged particle beam. The method further includes scanning, with a second charged particle beam of the N charged particle beams, second scan lines of at least some scan sections of the plurality of scan sections moving towards a probe spot of the second charged particle beam.

公开(公告)号：US11798777B2

公开(公告)日：2023-10-24

申请号：US16824499

申请日：2020-03-19

Applicant: ASML Netherlands B.V.

Inventor： Martinus Gerardus Maria Johannes Maassen ,  Peter Paul Hempenius ,  Weiming Ren ,  Zhongwei Chen

IPC: H01J37/21 ,  H01J37/244 ,  H01J37/28

CPC classification number: H01J37/21 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/0453 ,  H01J2237/2817

Abstract: A charged particle beam apparatus includes a beamlet forming unit configured to form and scan an array of beamlets on a sample. A first portion of the array of beamlets is focused onto a focus plane, and a second portion of the array of beamlets has at least one beamlet with a defocusing level with respect to the focus plane. The charged particle beam apparatus also includes a detector configured to detect an image of the sample formed by the array of beamlets, and a processor configured to estimate a level of separation between the focus plane and the sample based on the detected image and then reduce the level of separation based on the estimated level.