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公开(公告)号：WO2022042972A1
公开(公告)日：2022-03-03
申请号：PCT/EP2021/070842
申请日：2021-07-26
Applicant: ASML NETHERLANDS B.V.
IPC: G03F7/20
Abstract: Methods and systems for determining a mapped intensity metric are described. Determining the mapped intensity metric comprises determining an intensity metric for a manufacturing system. The intensity metric is determined based on a reflectivity of a location on a substrate and a manufacturing system characteristic. Determining the mapped intensity metric also comprises determining a mapped intensity metric for a reference system. The reference system has a reference system characteristic. The mapped intensity metric is determined based on the intensity metric, the manufacturing system characteristic, and the reference system characteristic, to mimic the determination of the intensity metric for the manufacturing system using the reference system. In some embodiments, the reference system is virtual, and the manufacturing system is physical.
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公开(公告)号：EP3961304A1
公开(公告)日：2022-03-02
申请号：EP20193721.6
申请日：2020-08-31
Applicant: ASML Netherlands B.V.
IPC: G03F7/20
Abstract: Methods and systems for determining a mapped intensity metric are described. Determining the mapped intensity metric comprises determining an intensity metric for a manufacturing system. The intensity metric is determined based on a reflectivity of a location on a substrate and a manufacturing system characteristic. Determining the mapped intensity metric also comprises determining a mapped intensity metric for a reference system. The reference system has a reference system characteristic. The mapped intensity metric is determined based on the intensity metric, the manufacturing system characteristic, and the reference system characteristic, to mimic the determination of the intensity metric for the manufacturing system using the reference system. In some embodiments, the reference system is virtual, and the manufacturing system is physical.
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