公开(公告)号：WO2017012840A1

公开(公告)日：2017-01-26

申请号：PCT/EP2016/065258

申请日：2016-06-30

Applicant: ASML NETHERLANDS B.V.

Inventor： DIRKS, Remco ,  VAN KRAAIJ, Markus, Gerardus, Martinus, Maria ,  PISARENCO, Maxim

IPC: G03F7/20

CPC classification number: G06F17/5009 ,  G03F7/70058 ,  G03F7/705 ,  G03F7/70625 ,  H01L21/3065 ,  H01L21/308 ,  H01L22/20

Abstract: Parameters of a structure (900) are measured by reconstruction from observed diffracted radiation. The method includes the steps: (a) defining a structure model to represent the structure in a two- or three-dimensional model space; (b) using the structure model to simulate interaction of radiation with the structure; and (c) repeating step (b) while varying parameters of the structure model. The structure model is divided into a series of slices (a-f) along at least a first dimension (Z) of the model space. By the division into slices, a sloping face (904, 906) of at least one sub-structure is approximated by a series of steps (904', 906') along at least a second dimension of the model space (X). The number of slices may vary dynamically as the parameters vary. The number of steps approximating said sloping face is maintained constant. Additional cuts (1302, 1304) are introduced, without introducing corresponding steps.

Abstract translation: 通过从观测的衍射辐射重建来测量结构（900）的参数。 该方法包括以下步骤：（a）定义结构模型以表示二维或三维模型空间中的结构; （b）利用结构模型模拟辐射与结构的相互作用; 和（c）重复步骤（b），同时改变结构模型的参数。 结构模型沿模型空间的至少第一维度（Z）分为一系列切片（a-f）。 通过划分成切片，至少一个子结构的倾斜面（904,906）通过沿着模型空间（X）的至少第二维度的一系列步骤（904'，906'）近似。 切片的数量可能随参数变化而动态变化。 接近所述倾斜面的步骤数保持恒定。 引入附加切割（1302,1304），而不引入相应的步骤。

公开(公告)号：WO2017102283A1

公开(公告)日：2017-06-22

申请号：PCT/EP2016/078762

申请日：2016-11-25

Applicant: ASML NETHERLANDS B.V.

Inventor： DIRKS, Remco ,  MOSSAVAT, Seyed Iman ,  CRAMER, Hugo, Augustinus, Joseph

IPC: G03F7/20

CPC classification number: G03F7/70508 ,  G03F7/70533 ,  G03F7/70633 ,  G03F7/70641 ,  G06F17/5081

Abstract: Disclosed herein is a method comprising: determining, using a computer, one or more statistical features from data obtained from a lithography process, a lithography apparatus, a substrate processed by the lithography process or the lithography apparatus; wherein determining the statistical features does not comprise reconstructing a characteristic of the lithography process, of the lithography apparatus, or of the substrate.

Abstract translation: 这里公开的是一种方法，包括：使用计算机从由光刻工艺，光刻设备，由光刻工艺或光刻设备处理的衬底获得的数据确定一个或多个统计特征; 其中确定所述统计特征不包括重构所述光刻过程，所述光刻设备或所述衬底的特性。

公开(公告)号：WO2022144203A1

公开(公告)日：2022-07-07

申请号：PCT/EP2021/086776

申请日：2021-12-20

Applicant: ASML NETHERLANDS B.V.

Inventor： ONOSE, Alexandru ,  TIEMERSMA, Bart, Jacobus, Martinus ,  VERHEUL, Nick ,  DIRKS, Remco

IPC: G06N3/04 ,  G06N3/08 ,  G01B11/00 ,  G03F7/20 ,  H01L21/66 ,  G01B11/02 ,  G01B11/06

Abstract: A modular autoencoder model is described. The modular autoencoder model comprises input models configured to process one or more inputs to a first level of dimensionality suitable for combination with other inputs; a common model configured to: reduce a dimensionality of combined processed inputs to generate low dimensional data in a latent space; and expand the low dimensional data in the latent space into one or more expanded versions of the one or more inputs suitable for generating one or more different outputs; output models configured to use the one or more expanded versions of the one or more inputs to generate the one or more different outputs, the one or more different outputs being approximations of the one or more inputs; and a prediction model configured to estimate one or more parameters based on the low dimensional data in the latent space.

公开(公告)号：WO2020182468A1

公开(公告)日：2020-09-17

申请号：PCT/EP2020/054967

申请日：2020-02-26

Applicant: ASML NETHERLANDS B.V.

Inventor： ONOSE, Alexandru ,  DIRKS, Remco ,  BOSCH, Roger, Hubertus, Elisabeth, Clementine ,  JACOBS, Sander, Silvester, Adelgondus, Marie ,  BUIJNSTERS, Frank, Jaco ,  DE ZWART, Siebe, Tjerk ,  PALHA DA SILVA CLERIGO, Artur ,  VERHEUL, Nick

IPC: G03F7/20

Abstract: Disclosed are a method, computer program and associated apparatuses for metrology. The method includes determining a reconstruction recipe describing at least nominal values for using in a reconstruction of a parameterization describing a target. The method comprises obtaining first measurement data relating to measurements of a plurality of targets on at least one substrate, said measurement data relating to one or more acquisition settings and performing an optimization by minimizing a cost function which minimizes differences between the first measurement data and simulated measurement data based on a reconstructed parameterization for each of said plurality of targets. A constraint on the cost function is imposed based on a hierarchical prior. Also disclosed is a hybrid model for providing simulated data for use in reconstruction, comprising obtaining a coarse model operable to provide simulated coarse data; and training a data driven model to correct said simulated coarse data so as to determine said simulated data.

公开(公告)号：WO2022144205A1

公开(公告)日：2022-07-07

申请号：PCT/EP2021/086783

申请日：2021-12-20

Applicant: ASML NETHERLANDS B.V.

Inventor： TIEMERSMA, Bart, Jacobus, Martinus ,  ONOSE, Alexandru ,  VERHEUL, Nick ,  DIRKS, Remco

IPC: G06N3/04 ,  G06N3/08 ,  G01B11/06 ,  G01B11/02 ,  G01B11/00 ,  G03F7/20 ,  H01L21/66

Abstract: A modular autoencoder model is described. The modular autoencoder model comprises input models configured to process one or more inputs to a first level of dimensionality suitable for combination with other inputs; a common model configured to: reduce a dimensionality of combined processed inputs to generate low dimensional data in a latent space; and expand the low dimensional data in the latent space into one or more expanded versions of the one or more inputs suitable for generating one or more different outputs; output models configured to use the one or more expanded versions of the one or more inputs to generate the one or more different outputs, the one or more different outputs being approximations of the one or more inputs; and a prediction model configured to estimate one or more parameters based on the low dimensional data in the latent space.

公开(公告)号：WO2022144204A1

公开(公告)日：2022-07-07

申请号：PCT/EP2021/086782

申请日：2021-12-20

Applicant: ASML NETHERLANDS B.V.

Inventor： ONOSE, Alexandru ,  TIEMERSMA, Bart, Jacobus, Martinus ,  VERHEUL, Nick ,  DIRKS, Remco ,  BARBIERI, Davide ,  VAN LAARHOVEN, Hendrik, Adriaan

IPC: G06N3/04 ,  G06N3/08 ,  G01B11/00 ,  G03F7/20 ,  H01L21/66 ,  G01B11/02 ,  G01B11/06

Abstract: A modular autoencoder model is described. The modular autoencoder model comprises input models configured to process one or more inputs to a first level of dimensionality suitable for combination with other inputs; a common model configured to: reduce a dimensionality of combined processed inputs to generate low dimensional data in a latent space; and expand the low dimensional data in the latent space into one or more expanded versions of the one or more inputs suitable for generating one or more different outputs; output models configured to use the one or more expanded versions of the one or more inputs to generate the one or more different outputs, the one or more different outputs being approximations of the one or more inputs; and a prediction model configured to estimate one or more parameters based on the low dimensional data in the latent space.

公开(公告)号：WO2017093011A1

公开(公告)日：2017-06-08

申请号：PCT/EP2016/077682

申请日：2016-11-15

Applicant: ASML NETHERLANDS B.V.

Inventor： MOSSAVAT, Seyed Iman ,  DIRKS, Remco ,  CRAMER, Hugo, Augustinus, Joseph

IPC: G03F7/20

CPC classification number: G01B11/02 ,  G03F7/705 ,  G03F7/70625

Abstract: Disclosed herein is a method comprising: obtaining measurement results of a device manufacturing or a product thereof; obtaining sets of one or more values of one or more parameters of a distribution by fitting the distribution against the measurement results, respectively; obtaining, using a computer, a set of one or more values of one or more hyperparameters of a hyperdistribution by fitting the hyperdistribution against the sets of values of the parameters.

Abstract translation: 本文公开了一种方法，其包括：获得装置制造或其产品的测量结果; 通过将分布与测量结果进行拟合，获得分布的一个或多个参数的一个或多个值的集合; 使用计算机通过将超分布与参数的值集合进行拟合来获得超分布的一个或多个超参数的一个或多个值的集合。

公开(公告)号：WO2022042972A1

公开(公告)日：2022-03-03

申请号：PCT/EP2021/070842

申请日：2021-07-26

Applicant: ASML NETHERLANDS B.V.

Inventor： DE ZWART, Siebe, Tjerk ,  DIRKS, Remco ,  NANDA, Gaurav ,  FAGGINGER AUER, Bastiaan, Onne

IPC: G03F7/20

Abstract: Methods and systems for determining a mapped intensity metric are described. Determining the mapped intensity metric comprises determining an intensity metric for a manufacturing system. The intensity metric is determined based on a reflectivity of a location on a substrate and a manufacturing system characteristic. Determining the mapped intensity metric also comprises determining a mapped intensity metric for a reference system. The reference system has a reference system characteristic. The mapped intensity metric is determined based on the intensity metric, the manufacturing system characteristic, and the reference system characteristic, to mimic the determination of the intensity metric for the manufacturing system using the reference system. In some embodiments, the reference system is virtual, and the manufacturing system is physical.

公开(公告)号：WO2020074162A1

公开(公告)日：2020-04-16

申请号：PCT/EP2019/072355

申请日：2019-08-21

Applicant: ASML NETHERLANDS B.V.

Inventor： MOSSAVAT, Seyed Iman ,  FAGGINGER AUER, Bastiaan, Onne ,  DIRKS, Remco ,  ONOSE, Alexandru ,  CRAMER, Hugo, Augustinus, Joseph

IPC: G03F7/20

Abstract: Methods for calibrating metrology apparatuses and determining a parameter of interest are disclosed. In one arrangement, training data is provided that comprises detected representations of scattered radiation detected by each of plural metrology apparatuses. An encoder encodes each detected representation to provide an encoded representation, and a decoder generates a synthetic detected representation from the respective encoded representation. A classifier estimates from which metrology apparatus originates each encoded representation or each synthetic detected representation. The training data is used to simultaneously perform, in an adversarial relationship relative to each other, a first machine learning process involving the encoder or decoder and a second machine learning process involving the classifier.

公开(公告)号：WO2020035275A1

公开(公告)日：2020-02-20

申请号：PCT/EP2019/069956

申请日：2019-07-24

Applicant: ASML NETHERLANDS B.V.

Inventor： MOSSAVAT, Seyed Iman ,  DIRKS, Remco ,  SMILDE, Hendrik, Jan, Hidde

IPC: G03F7/20

Abstract: A method of determining an estimated intensity of radiation scattered by a target illuminated by a radiation source, has the following steps: obtaining and training (402) a library REFLIB of wavelength- dependent reflectivity as a function of the wavelength, target structural parameters and angle of incidence R(λ,θ,x,y); determining (408) a wide-band library (W-BLIB) of integrals of wavelength-dependent reflectivity R of the target in a Jones framework over a range of radiation source wavelengths λ; training (TRN) (410) the wide-band library; and determining (412), using the trained wide-band library, an estimated intensity (INT) of radiation scattered by the target illuminated by the radiation source.