公开(公告)号：WO2013079270A1

公开(公告)日：2013-06-06

申请号：PCT/EP2012/071427

申请日：2012-10-30

Applicant: ASML NETHERLANDS B.V.

Inventor： MIDDLEBROOKS, Scott ,  PLUIJMS, René ,  COOGANS, Martyn ,  NOOT, Marc

IPC: G03F7/20

CPC classification number: G03F7/70625 ,  G03F7/70525 ,  G03F7/70641

Abstract: Disclosed is an inspection method, and corresponding apparatus, enabling classification of pupil images according to a process variable. The method comprises acquiring diffraction pupil images of a plurality of structures formed on a substrate during a lithographic process. A process variable of the lithographic process was varied between formation of the structures, the variation of the process variable resulting in a variation in the diffraction pupil images. The method further comprised determining at least one discriminant function for the diffraction pupil images, the discriminant function being able to classify the pupil images in terms of the process variable.

Abstract translation: 公开了一种检查方法和相应的装置，使得能够根据过程变量对瞳孔图像进行分类。 该方法包括在光刻工艺期间获取在基板上形成的多个结构的衍射光瞳图像。 光刻过程的过程变量在结构的形成之间变化，过程变量的变化导致衍射光瞳图像的变化。 该方法还包括确定用于衍射光瞳图像的至少一个判别函数，所述判别函数能够根据过程变量对瞳孔图像进行分类。

公开(公告)号：EP3435162A1

公开(公告)日：2019-01-30

申请号：EP17183849.3

申请日：2017-07-28

Applicant: ASML Netherlands B.V.

Inventor： NOOT, Marc ,  MATHIJSSEN, Simon, Gijsbert, Josephus ,  BHATTACHARYYA, Kaustuve ,  BYUN, Jin-Moo ,  KIM, Hyun Su ,  JANG, Won-Jae

IPC: G03F7/20

Abstract: Disclosed are a method, computer program and a metrology apparatus for measuring a process effect parameter relating to a manufacturing process for manufacturing integrated circuits on a substrate. The method comprises determining for a structure, a first quality metric value for a quality metric from a plurality of measurement values each relating to a different measurement condition while cancelling or mitigating for the effect of the process effect parameter on the plurality of measurement values and a second quality metric value for the quality metric from at least one measurement value relating to at least one measurement condition without cancelling or mitigating for the effect of the process effect parameter on the at least one measurement value. The process effect parameter value for the process effect parameter can then be calculated from the first quality metric value and the second quality metric value, for example by calculating their difference.