公开(公告)号：WO2016192917A1

公开(公告)日：2016-12-08

申请号：PCT/EP2016/059957

申请日：2016-05-04

Applicant: ASML NETHERLANDS B.V.

Inventor： BEARDA, Jelte, Rients ,  KLUGKIST, Joost, André ,  VOOGD, Robbert Jan ,  HERGENHAN, Guido ,  PANITZ, Meik ,  TAUBERT, Jochen

IPC: G03F7/20 ,  G02B5/22

CPC classification number: G03F7/70191 ,  G03F7/70308 ,  G03F7/7085

Abstract: A method of forming a radiation filter for use in a lithographic system comprises obtaining a filter body and forming at least one structure in or on the body, wherein the at least one structure provides a filtering effect and least one of a), b), c) or d):- a) the at least one structure comprises a plurality of transmissive, reflective, absorbing or fluorescent structures, and the method comprises providing a desired distribution of the structures to provide a desired filtering effect; b) forming the at least one structure comprises forming at least one transmissive, absorbing, reflective or fluorescent layer that has a variable thickness; c) forming the at least one structure comprises altering at least one optical property to provide a variation of the optical property with position; d) the structure comprises a fluorescent layer that provides variation of at least one fluorescence property with position and/or angle of incidence.

Abstract translation: 一种形成用于光刻系统中的辐射滤光器的方法包括获得滤光片主体并且在所述主体内或上面形成至少一个结构，其中所述至少一个结构提供过滤效果，并且a），b）， c）或d）：a）所述至少一个结构包括多个透射，反射，吸收或荧光结构，并且所述方法包括提供所述结构的期望分布以提供期望的滤波效果; b）形成所述至少一个结构包括形成具有可变厚度的至少一个透射，吸收，反射或荧光层; c）形成所述至少一个结构包括改变至少一个光学性质以提供所述光学性质与位置的变化; d）该结构包括提供至少一种荧光性质与位置和/或入射角的变化的荧光层。