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公开(公告)号：WO2013174539A1
公开(公告)日：2013-11-28
申请号：PCT/EP2013/055701
申请日：2013-03-19
Applicant: ASML NETHERLANDS B.V.
Inventor： LAURENT, Thibault , JACOBS, Johannes, Henricus, Wilhelmus , KOK, Haico , VAN DE VIJVER, Yuri , VAN DE WAL, Johannes , KNARREN, Bastiaan , VOOGD, Robbert Jan , WESTERLAKEN, Jan, Steven, Christiaan , VAN DE RIJDT, Hans , KOOIKER, Eelco , HURKENS-MERTENS, Wilhelmina Margareta Jozef , TEILLET, Yohann, Bruno, Yvon
IPC: G03F7/20
CPC classification number: G03F7/7085 , G03F7/70341 , G03F7/70666 , G03F7/70858 , G03F7/70891
Abstract: A sensor (100) for use in lithographic apparatus of an immersion type and which, in use, comes into contact with the immersion liquid (11) is arranged so that the thermal resistance of a first heat path from a transducer (104) of the sensor to a temperature conditioning device (107) is less than the thermal resistance of a second heat flow path from the transducer to the immersion liquid. Thus, heat flow is preferentially towards the temperature conditioning device and not the immersion liquid so that temperature-induced disturbance in the immersion liquid is reduced or minimized.
Abstract translation: 用于浸没式光刻设备中并且在使用中与浸液（11）接触的传感器（100）被布置成使得来自第一传感器（104）的第一热路的热阻 温度调节装置（107）的传感器小于从换能器到浸液的第二热流路的热阻。 因此，热流优先朝向温度调节装置，而不是浸没液体，使得浸没液体中的温度引起的干扰减小或最小化。
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公开(公告)号：WO2017032525A1
公开(公告)日：2017-03-02
申请号：PCT/EP2016/067615
申请日：2016-07-25
Applicant: ASML NETHERLANDS B.V.
IPC: G03F7/20
CPC classification number: G03F7/70191 , G03F7/70116 , G03F7/70566
Abstract: An illumination system (IL) for a lithographic apparatus comprising a polarization adjustment apparatus (15) arranged to receive linearly polarized radiation, the polarization adjustment apparatus comprising regions which are configured to rotate the polarization orientation by different amounts, a directing apparatus (6) operable to direct the radiation through one or more regions of the polarization adjustment apparatus, a controller (CN) configured to control the directing apparatus so as to control which of the one or more regions of the polarization adjustment apparatus radiation is directed through, wherein the controller is configured to limit which of the regions radiation is directed through to one or more regions which rotate the orientation of the linear polarization by substantially the same amount, and a diffuser configured to receive radiation output from the polarization adjustment apparatus and increase a range of angles at which the radiation propagates whilst substantially conserving the polarization state of the radiation.
Abstract translation: 一种用于光刻设备的照明系统（IL），包括布置成接收线性偏振辐射的偏振调节装置（15），所述偏振调节装置包括被配置为使偏振取向旋转不同量的区域;定向装置（6） 将辐射引导通过偏振调节装置的一个或多个区域;控制器（CN），被配置为控制引导装置，以便控制偏振调节装置辐射的一个或多个区域中的哪一个被引导通过，其中控制器 被配置为限制辐射区域中的哪一个被引导到一个或多个区域，所述区域使线性偏振的取向旋转基本相同的量，以及扩散器，被配置为接收从偏振调节装置输出的辐射并增加角度范围 辐射在此处传播 保护辐射的极化状态。
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公开(公告)号：WO2017207512A2
公开(公告)日：2017-12-07
申请号：PCT/EP2017/062941
申请日：2017-05-30
Applicant: ASML NETHERLANDS B.V.
Inventor： SCHASFOORT, Gerard, Frans, Jozef , DE GROOT, Pieter , SLADKOV, Maksym, Yuriiovych , DIKKERS, Manfred, Petrus, Johannes, Maria , FINDERS, Jozef, Maria , VAN ZWOL, Pieter-Jan , BASELMANS, Johannes, Jacobus, Matheus , BAUMER, Stefan , DE WINTER, Laurentius, Cornelius , ENGELEN, Wouter, Joep , VAN DE KERKHOF, Marcus, Adrianus , VOOGD, Robbert Jan
Abstract: A patterning device comprising a reflective marker, wherein the marker comprises: a plurality of reflective regions configured to preferentially reflect radiation having a given wavelength; and a plurality of absorbing regions configured to preferentially absorb radiation having the given wavelength; wherein the absorbing and reflective regions are arranged to form a patterned radiation beam reflected from the marker when illuminated with radiation, and wherein the reflective regions comprise a roughened reflective surface, the roughened reflective surface being configured to diffuse radiation reflected from the reflective regions, and wherein the roughened reflective surface has a root mean squared roughness of about an eighth of the given wavelength or more.
Abstract translation: 图案形成装置，其包括反射标记，其中所述标记包括：多个反射区域，其被配置为优先反射具有给定波长的辐射; 以及配置为优先吸收具有给定波长的辐射的多个吸收区域; 其中所述吸收和反射区域被布置为当用辐射照射时形成从所述标记反射的图案化的辐射束，并且其中所述反射区域包括粗糙的反射表面，所述粗糙的反射表面被配置为漫射从所述反射区域反射的辐射，以及 其中粗糙化的反射表面具有约为给定波长的八分之一或更多的均方根粗糙度。
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公开(公告)号：WO2017050508A1
公开(公告)日：2017-03-30
申请号：PCT/EP2016/069921
申请日：2016-08-24
Applicant: ASML NETHERLANDS B.V.
Inventor： VOOGD, Robbert Jan , BASELMANS, Johannes, Jacobus, Matheus , MOEST, Bearrach , STAS, Roland, Johannes, Wilhelmus , VAN DAMME, Jean-Philippe, Xavier
CPC classification number: G03F7/706 , G03F7/70633 , G03F7/70783 , G03F7/7085 , G03F7/70983 , G03F9/70 , G03F9/7019 , G03F9/7026
Abstract: Controlling, based on characteristics, a lithographic apparatus having an exposure mode configured to expose a wafer held by a substrate table to an image of a pattern on a production reticle via a projection system, wherein in the exposure mode the production reticle is held at a reticle stage and is protected by a pellicle, the method comprising determining the characteristics of the projecting in a calibration mode, and the controlling comprising moving in the exposure mode at least one of the projection system, the reticle stage and the substrate table during the exposing in dependence on the characteristics.
Abstract translation: 基于特性控制具有曝光模式的光刻设备，该曝光模式被配置为经由投影系统将由基板台保持的晶片暴露于生产掩模版上的图案的图像，其中在曝光模式下，将制作掩模版保持在 所述方法包括在校准模式中确定所述投影的特性，并且所述控制包括在所述曝光期间在所述曝光模式中移动所述投影系统，所述标线片平台和所述衬底台中的至少一个 依靠特点。
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Patent Agency Ranking
公开(公告)号：WO2016192917A1
公开(公告)日：2016-12-08
申请号：PCT/EP2016/059957
申请日：2016-05-04
Applicant: ASML NETHERLANDS B.V.
Inventor： BEARDA, Jelte, Rients , KLUGKIST, Joost, André , VOOGD, Robbert Jan , HERGENHAN, Guido , PANITZ, Meik , TAUBERT, Jochen
CPC classification number: G03F7/70191 , G03F7/70308 , G03F7/7085
Abstract: A method of forming a radiation filter for use in a lithographic system comprises obtaining a filter body and forming at least one structure in or on the body, wherein the at least one structure provides a filtering effect and least one of a), b), c) or d):- a) the at least one structure comprises a plurality of transmissive, reflective, absorbing or fluorescent structures, and the method comprises providing a desired distribution of the structures to provide a desired filtering effect; b) forming the at least one structure comprises forming at least one transmissive, absorbing, reflective or fluorescent layer that has a variable thickness; c) forming the at least one structure comprises altering at least one optical property to provide a variation of the optical property with position; d) the structure comprises a fluorescent layer that provides variation of at least one fluorescence property with position and/or angle of incidence.
Abstract translation: 一种形成用于光刻系统中的辐射滤光器的方法包括获得滤光片主体并且在所述主体内或上面形成至少一个结构，其中所述至少一个结构提供过滤效果，并且a），b）， c）或d）：a）所述至少一个结构包括多个透射，反射，吸收或荧光结构，并且所述方法包括提供所述结构的期望分布以提供期望的滤波效果; b）形成所述至少一个结构包括形成具有可变厚度的至少一个透射，吸收，反射或荧光层; c）形成所述至少一个结构包括改变至少一个光学性质以提供所述光学性质与位置的变化; d）该结构包括提供至少一种荧光性质与位置和/或入射角的变化的荧光层。
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公开(公告)号：WO2019149468A1
公开(公告)日：2019-08-08
申请号：PCT/EP2019/050134
申请日：2019-01-04
Applicant: ASML NETHERLANDS B.V.
Inventor： CHONG, Derick, Yun, Chek , DE GROOT, Pieter, Cristiaan , BASELMANS, Johannes, Jacobus, Matheus , VOOGD, Robbert Jan
CPC classification number: G03F7/706 , G01B9/02098 , G01M11/005
Abstract: A phase stepping method for determining an aberration map for a projection system and an apparatus for carrying out said method. The method uses first patterned region arranged in an object plane of the projection system and a second patterned region arranged in an image plane of the projection system. At least one of the first and second patterning regions is moved in a shearing direction to generate an oscillating phase stepping signal. A set of coefficients that characterize the aberration map of the projection system are determined by equating the phase of a harmonic of the oscillating signal at each of the plurality of positions on the radiation detector to a combination of a plurality of differences in the aberration map between a pair of positions in a pupil plane of the projection system and solving to find the set of coefficients.
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公开(公告)号：WO2017207512A3
公开(公告)日：2017-12-07
申请号：PCT/EP2017/062941
申请日：2017-05-30
Applicant: ASML NETHERLANDS B.V.
Inventor： SCHASFOORT, Gerard, Frans, Jozef , DE GROOT, Pieter , SLADKOV, Maksym, Yuriiovych , DIKKERS, Manfred, Petrus, Johannes, Maria , FINDERS, Jozef, Maria , VAN ZWOL, Pieter-Jan , BASELMANS, Johannes, Jacobus, Matheus , BAUMER, Stefan , DE WINTER, Laurentius, Cornelius , ENGELEN, Wouter, Joep , VAN DE KERKHOF, Marcus, Adrianus , VOOGD, Robbert Jan
Abstract: A patterning device comprising a reflective marker, wherein the marker comprises: a plurality of reflective regions configured to preferentially reflect radiation having a given wavelength; and a plurality of absorbing regions configured to preferentially absorb radiation having the given wavelength; wherein the absorbing and reflective regions are arranged to form a patterned radiation beam reflected from the marker when illuminated with radiation, and wherein the reflective regions comprise a roughened reflective surface, the roughened reflective surface being configured to diffuse radiation reflected from the reflective regions, and wherein the roughened reflective surface has a root mean squared roughness of about an eighth of the given wavelength or more.
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公开(公告)号：WO2014060149A1
公开(公告)日：2014-04-24
申请号：PCT/EP2013/068669
申请日：2013-09-10
Applicant: ASML NETHERLANDS B.V.
Inventor： KOK, Haico , VOOGD, Robbert Jan
CPC classification number: G03F7/70775 , G01B11/0675 , G01B11/14 , G03F7/70483 , G03F7/70525 , G03F9/7046 , G03F9/7049 , G03F9/7092
Abstract: A sensor system to measure a physical quantity, the system including a parallel detection arrangement with multiple detectors to allow measurements in parallel at different spatial locations, wherein the multiple detectors share a noise source, wherein the sensor system is configured such that the multiple detectors each output a signal as a function of the physical quantity, and wherein the sensor system is configured such that at least one detector responds differently to noise originating from the shared noise source than the one or more other detectors.
Abstract translation: 一种用于测量物理量的传感器系统，所述系统包括具有多个检测器的并行检测装置，以允许在不同空间位置处并行测量，其中所述多个检测器共享噪声源，其中所述传感器系统被配置为使得所述多个检测器 输出作为物理量的函数的信号，并且其中所述传感器系统被配置为使得至少一个检测器对所述共享噪声源产生的噪声的响应不同于所述一个或多个其它检测器。
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公开(公告)号：EP2909677A1
公开(公告)日：2015-08-26
申请号：EP13759242.4
申请日：2013-09-10
Applicant: ASML Netherlands B.V.
Inventor： KOK, Haico , VOOGD, Robbert Jan
CPC classification number: G03F7/70775 , G01B11/0675 , G01B11/14 , G03F7/70483 , G03F7/70525 , G03F9/7046 , G03F9/7049 , G03F9/7092
Abstract: A sensor system to measure a physical quantity, the system including a parallel detection arrangement with multiple detectors to allow measurements in parallel at different spatial locations, wherein the multiple detectors share a noise source, wherein the sensor system is configured such that the multiple detectors each output a signal as a function of the physical quantity, and wherein the sensor system is configured such that at least one detector responds differently to noise originating from the shared noise source than the one or more other detectors.
Abstract translation: 一种用于测量物理量的传感器系统，所述系统包括具有多个检测器的并行检测装置，以允许在不同空间位置处并行测量，其中所述多个检测器共享噪声源，其中所述传感器系统被配置为使得所述多个检测器 输出作为物理量的函数的信号，并且其中所述传感器系统被配置为使得至少一个检测器响应于来自所述共享噪声源的噪声不同于所述一个或多个其它检测器
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