公开(公告)号：US20240184222A1

公开(公告)日：2024-06-06

申请号：US18443827

申请日：2024-02-16

Applicant: ASML Netherlands B.V.

Inventor： Guido DE HAAN ,  Stephen EDWARD ,  Thomas Jan VAN DEN HOOVEN ,  Paulus Clemens Maria PLANKEN ,  Irwan Dani SETIJA

IPC: G03F9/00

CPC classification number: G03F9/7088 ,  G03F9/7069 ,  G03F9/7084

Abstract: Disclosed is a method for measuring a target located on a substrate beneath at least one layer. The method comprises exciting said at least one layer with pump radiation comprising at least one pump wavelength, so as to generate an acoustic wave within said at least one layer which reflects of said target thereby generating an acoustic replica of said target at a surface of said substrate and illuminating said acoustic replica with probe radiation comprising at least one probe wavelength and capturing the resultant scattered probe radiation, scattered from the acoustic replica. One or both of said exciting step and said illuminating step comprises generating Surface Plasmon Polaritons (SPPs) on residual topography of said at least one layer resultant from said target.

公开(公告)号：US20190354026A1

公开(公告)日：2019-11-21

申请号：US16478068

申请日：2018-01-10

Applicant: ASML NETHERLANDS B.V.

Inventor： Stefan Michiel WITTE ,  Alessandro ANTONCECCHI ,  Stephen EDWARD ,  Hao ZHANG ,  Paulus Clemens Maria PLANKEN ,  Kjeld Sijbrand Eduard EIKEMA ,  Sebastianus Adrianus GOORDEN ,  Simon Reinald HUISMAN ,  Irwan Dani SETIJA

IPC: G03F9/00 ,  G01B11/24 ,  G01B17/06

Abstract: As increasing numbers of layers, using increasing numbers of specific materials, are deposited on substrates, it becomes increasingly difficult to detect alignment marks accurately for, for example, applying a desired pattern onto a substrate using a lithographic apparatus, in part due to one or more of the materials used in one or more of the layers being wholly or partially opaque to the radiation used to detect alignment marks. In a first step, the substrate is illuminated with excitation radiation. In a second step, at least one effect associated with a reflected material effect scattered by a buried structure is measured. The effect may, for example, include a physical displacement of the surface of the substrate. In a third step, at least one characteristic of the structure based on the measured effect is derived.