公开(公告)号：US20210382396A1

公开(公告)日：2021-12-09

申请号：US17283588

申请日：2019-10-17

Applicant: ASML NETHERLANDS B.V.

Inventor： Pawel SAFINOWSKI ,  Derk Servatius Gertruda BROUNS

IPC: G03F7/20 ,  G03F1/62

Abstract: An inspection apparatus for inspecting an object such as a pellicle for use in an EUV lithographic apparatus, the inspection apparatus including: a vacuum chamber; a load lock forming an interface between the vacuum chamber and an ambient environment; and a stage apparatus configured to receive the object from the load lock and displace the object inside the vacuum chamber, wherein the vacuum chamber includes a first parking position and a second parking position for temporarily storing the object.

公开(公告)号：US20230004093A1

公开(公告)日：2023-01-05

申请号：US17943809

申请日：2022-09-13

Applicant: ASML NETHERLANDS B.V.

Inventor： Pawel SAFINOWSKI ,  Derk Servatius Gertruda BROUNS

IPC: G03F7/20 ,  G03F1/62

Abstract: An inspection apparatus for inspecting an object such as a pellicle for use in an EUV lithographic apparatus, the inspection apparatus including: a vacuum chamber; a load lock forming an interface between the vacuum chamber and an ambient environment; and a stage apparatus configured to receive the object from the load lock and displace the object inside the vacuum chamber, wherein the vacuum chamber comprises a first parking position and a second parking position for temporarily storing the object.