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公开(公告)号：US20180373141A1
公开(公告)日：2018-12-27
申请号：US16060837
申请日：2016-12-02
Applicant: ASML NETHERLANDS B.V.
Inventor： Derk Servatius Gertruda BROUNS , Paul JANSSEN , Mohammad Reza KAMALI , Maria PETER , Willem Joan VAN DER ZANDE , Pieter-Jan VAN ZWOL , David Ferdinand VLES , Willem-Pieter VOORTHUIJZEN
Abstract: A membrane assembly for EUV lithography, the membrane assembly including: a planar membrane; a border configured to hold the membrane; and a frame assembly connected to the border and configured to attach to a patterning device for EUV lithography, wherein the frame assembly is connected to the border in a direction perpendicular to the plane of the membrane such that in use the frame assembly is between the border and the patterning device.
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公开(公告)号：US20180329314A1
公开(公告)日：2018-11-15
申请号：US15526654
申请日：2015-11-16
Applicant: ASML NETHERLANDS B.V.
Inventor： Matthias KRUIZINGA , Maarten Mathijs Marinus JANSEN , Jorge Manuel AZEREDO LIMA , Erik Willem BOGAART , Derk Servatius Gertruda BROUNS , Marc BRUIJN , Richard Joseph BRULS , Jeroen DEKKERS , Paul JANSSEN , Mohammad Reza KAMALI , Ronald Harm Gunther KRAMER , Robert Gabriël Maria LANSBERGEN , Martinus Hendrikus Antonius LEENDERS , Matthew LIPSON , Erik Roelof LOOPSTRA , Joseph H. LYONS , Stephen ROUX , Gerrit VAN DEN BOSCH , Sander VAN DEN HEIJKANT , Sandra VAN DER GRAAF , Frits VAN DER MEULEN , Jérôme François Sylvain Virgile VAN LOO , Beatrijs Louise Marie-Joseph Katrien VERBRUGGE
CPC classification number: G03F7/70983 , G03F1/22 , G03F1/64 , G03F7/70825
Abstract: A mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount is configured to suspend the pellicle frame relative to the patterning device such that there is a gap between the pellicle frame and the patterning device; and wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.
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公开(公告)号：US20240103386A1
公开(公告)日：2024-03-28
申请号：US18376237
申请日：2023-10-03
Applicant: ASML NETHERLANDS B.V , ASML HOLDING N.V
Inventor： Derk Servatius Gertruda BROUNS , Joshua ADAMS , Aage BENDIKSEN , Richard JACOBS , Andrew JUDGE , Veera Venkata Narasimha Narendra Phani KOTTAPALLI , Joseph Harry LYONS , Theodorus Marinus MODDERMAN , Manish RANJAN , Marcus Adrianus VAN DE KERKHOF , Xugang XIONG
CPC classification number: G03F7/7085 , G03F1/62 , G03F1/64 , G03F7/70033 , G03F7/70891 , G03F7/70983
Abstract: An apparatus for determining a condition associated with a pellicle for use in a lithographic apparatus, the apparatus including a sensor, wherein the sensor is configured to measure a property associated with the pellicle, the property being indicative of the pellicle condition.
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公开(公告)号：US20220155675A1
公开(公告)日：2022-05-19
申请号：US17433038
申请日：2020-02-25
Applicant: ASML NETHERLANDS B.V.
Inventor： Ilya MALAKHOVSKY , Derk Servatius Gertruda BROUNS , Joffrey Rene Sylvian CRAQUELIN , Edward HAGE , Pieter Renaat Maria HENNUS , Jan Willem Adriaan OOSTERLING , Ludolf POSTMA , Marcel Duco SNEL , Johannes Charles Adrianus VAN DEN BERG , Wouter VAN DER CHIJS , Bartel Joris VAN DER VEEK , Mike Johannes Antonius VAN KUIJK , Marina Antoinetta Leonarda VAN UUM-VAN HERK , Henricus Marinus Theodorus WIERSMA
Abstract: An object handling apparatus for handling a generally planar object, the object handling apparatus including: two support arms, at least one of the two support arms movable relative to another support arm generally in a plane such that the two support arms are operable to grip and hold an object disposed in the plane, wherein each of the support arms includes at least one support pad and at least one aligner, the support pads configured to locally contact a surface of the object and apply a force thereto generally perpendicular to the plane so as to support the object and the at least one aligner configured to locally contact a surface of the object and apply a force thereto generally in the plane so as to grip the object.
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公开(公告)号：US20160033860A1
公开(公告)日：2016-02-04
申请号：US14775249
申请日：2014-03-04
Applicant: ASML NETHERLANDS B.V.
Inventor： James Norman WILEY , Juan Diego ARIAS ESPINOZA , Derk Servatius Gertruda BROUNS , Laurentius Cornelius DE WINTER , Florian Didier Albin DHALLUIN , Pedro Julian RIZO DIAGO , Luigi SCACCABAROZZI
IPC: G03F1/64
CPC classification number: G03F1/64 , G03F1/62 , G03F7/70908 , G03F7/70983
Abstract: The present invention is concerned with an apparatus for shielding a reticle for EUV lithography. The apparatus comprises a pellicle, and at least one actuator in communication with the pellicle, the actuator being configured to induce, in use, movement of the pellicle with respect to a reticle.
Abstract translation: 本发明涉及用于屏蔽用于EUV光刻的掩模版的装置。 该装置包括防护薄膜组件和至少一个与防护薄膜组件连通的致动器，所述致动器构造成在使用中诱导防护薄膜相对于掩模版的运动。
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Patent Agency Ranking
公开(公告)号：US20230004093A1
公开(公告)日：2023-01-05
申请号：US17943809
申请日：2022-09-13
Applicant: ASML NETHERLANDS B.V.
Inventor： Pawel SAFINOWSKI , Derk Servatius Gertruda BROUNS
Abstract: An inspection apparatus for inspecting an object such as a pellicle for use in an EUV lithographic apparatus, the inspection apparatus including: a vacuum chamber; a load lock forming an interface between the vacuum chamber and an ambient environment; and a stage apparatus configured to receive the object from the load lock and displace the object inside the vacuum chamber, wherein the vacuum chamber comprises a first parking position and a second parking position for temporarily storing the object.
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公开(公告)号：US20190129299A1
公开(公告)日：2019-05-02
申请号：US16093537
申请日：2017-04-12
Applicant: ASML NETHERLANDS B.V.
Inventor： Maxim Aleksandrovich NASALEVICH , Erik Achilles ABEGG , Nirupam BANERJEE , Michiel Alexander BLAUW , Derk Servatius Gertruda BROUNS , Paul JANSSEN , Matthias KRUIZINGA , Egbert LENDERINK , Nicolae MAXIM , Andrey NIKIPELOV , Arnoud Willem NOTENBOOM , Claudia PILIEGO , Mária PÉTER , Gijsber RISPENS , Nadja SCHUH , Marcus Adrianus VAN DE KERKHOF , Willem Joan VAN DER ZANDE , Pieter-Jan VAN ZWOL , Antonius Willem VERBURG , Johannes Petrus Martinus Bernardus VERMEULEN , David Ferdinand VLES , Willem-Pieter VOORTHUIJZEN , Aleksandar Nikolov ZDRAVICOV
Abstract: Membranes for EUV lithography are disclosed. In one arrangement, a membrane has a stack having layers in the following order: a first capping layer including an oxide of a first metal; a base layer including a compound having a second metal and an additional element selected from the group consisting of Si, B, C and N; and a second capping layer including an oxide of a third metal, wherein the first metal is different from the second metal and the third metal is the same as or different from the first metal.
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公开(公告)号：US20180364561A1
公开(公告)日：2018-12-20
申请号：US16062017
申请日：2016-12-02
Applicant: ASML NETHERLANDS B.V. , ASML HOLDING N.V.
Inventor： David Ferdinand VLES , Erik Achilles ABEGG , Aage BENDIKSEN , Derk Servatius Gertruda BROUNS , Pradeep K. GOVIL , Paul JANSSEN , Maxim Aleksandrovich NASALEVICH , Arnoud Willem NOTENBOOM , Mária PÉTER , Marcus Adrianus VAN DE KERKHOF , Willem Joan VAN DER ZANDE , Pieter-Jan VAN ZWOL , Johannes Petrus Martinus Bernardus VERMEULEN , Willem-Pieter VOORTHUIJZEN , James Norman WILEY
Abstract: A pellicle suitable for use with a patterning device for a lithographic apparatus. The pellicle includes at least one breakage region which is configured to preferentially break, during normal use in a lithographic apparatus, prior to breakage of remaining regions of the pellicle.
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公开(公告)号：US20180314150A1
公开(公告)日：2018-11-01
申请号：US15545390
申请日：2016-02-01
Applicant: ASML Netherlands B.V.
Inventor： Derk Servatius Gertruda BROUNS , Dennis DE GRAAF , Robertus Cornelis Martinus DE KRUIF , Paul JANSSEN , Matthias KRUIZINGA , Arnoud Willem NOTENBOOM , Daniel Andrew SMITH , Beatrijs Louise Marie-Joseph Katrien VERBRUGGE , James Norman WILEY
Abstract: A method comprising the steps of receiving a mask assembly comprising a mask and a removable EUV transparent pellicle held by a pellicle frame, removing the pellicle frame and EUV transparent pellicle from the mask, using an inspection tool to inspect the mask pattern on the mask, and subsequently attaching to the mask an EUV transparent pellicle held by a pellicle frame. The method may also comprise the following steps: after removing the pellicle frame and EUV transparent pellicle from the mask, attaching to the mask an alternative pellicle frame holding an alternative pellicle formed from a material which is substantially transparent to an inspection beam of the inspection tool; and after using an inspection tool to inspect the mask pattern on the mask, removing the alternative pellicle held by the alternative pellicle frame from the mask in order to attach to the mask the EUV transparent pellicle held by the pellicle frame.
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公开(公告)号：US20240004283A1
公开(公告)日：2024-01-04
申请号：US18227833
申请日：2023-07-28
Applicant: ASML NETHERLANDS B.V.
Inventor： Maxim Aleksandrovich Nasalevich , Erik Achilles ABEGG , Nirupam BANERJEE , Michiel Alexander BLAUW , Derk Servatius Gertruda BROUNS , Paul JANSSEN , Matthias KRUIZINGA , Egbert LENDERINK , Nicolae MAXIM , Andrey NIKIPELOV , Arnoud Willem NOTENBOOM , Claudia PILIEGO , Mária PÉTER , Gijsbert RISPENS , Nadja SCHUH , Marcus Adrianus VAN DE KERKHOF , Willem Joan VAN DER ZANDE , Pieter-Jan VAN ZWOL , Antonius Willem VERBURG , Johannes Petrus Martinus Bernardus VERMEULEN , David Ferdinand VLES , Willem-Pieter VOORTHUIJZEN , Aleksandar Nikolov ZDRAVKOV
CPC classification number: G03F1/62 , G03F7/70191 , G03F7/70983 , G03F1/82 , G03F7/70916 , G03F7/70958 , G03F7/70575 , G02B5/208 , G02B5/283
Abstract: Membranes for EUV lithography are disclosed. In one arrangement, a membrane has a stack having layers in the following order: a first capping layer including an oxide of a first metal; a base layer including a compound having a second metal and an additional element selected from the group consisting of Si, B, C and N; and a second capping layer including an oxide of a third metal, wherein the first metal is different from the second metal and the third metal is the same as or different from the first metal.
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