公开(公告)号：US12124176B2

公开(公告)日：2024-10-22

申请号：US17943809

申请日：2022-09-13

Applicant: ASML NETHERLANDS B.V.

Inventor： Pawel Safinowski ,  Derk Servatius Gertruda Brouns

IPC: G03F7/20 ,  G03F1/62 ,  G03F7/00

CPC classification number: G03F7/7065 ,  G03F1/62

Abstract: An inspection apparatus for inspecting an object such as a pellicle for use in an EUV lithographic apparatus, the inspection apparatus including: a vacuum chamber; a load lock forming an interface between the vacuum chamber and an ambient environment; and a stage apparatus configured to receive the object from the load lock and displace the object inside the vacuum chamber, wherein the vacuum chamber comprises a first parking position and a second parking position for temporarily storing the object.

公开(公告)号：US11474438B2

公开(公告)日：2022-10-18

申请号：US17283588

申请日：2019-10-17

Applicant: ASML NETHERLANDS B.V.

Inventor： Pawel Safinowski ,  Derk Servatius Gertruda Brouns

IPC: G03F7/20 ,  G03F1/62

Abstract: An inspection apparatus for inspecting an object such as a pellicle for use in an EUV lithographic apparatus, the inspection apparatus including: a vacuum chamber; a load lock forming an interface between the vacuum chamber and an ambient environment; and a stage apparatus configured to receive the object from the load lock and displace the object inside the vacuum chamber, wherein the vacuum chamber includes a first parking position and a second parking position for temporarily storing the object.